An analysis of chlorine trifluoride as an effective substitute for nitrogen triflouride in the chemical vapor deposition reactor cleaning process

Description

Thesis--PlanB (M.S.)--University of Wisconsin--Stout, 1998. / Includes bibliographical references.

Links & Downloads

1. http://www.uwstout.edu/lib/thesis/1998/1998vandykes.pdf

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/40471652
Date	January 1998
Creators	Van Dyke, Stephanie A.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Online version