Return to search

Advances in photoresist characterization and lithography simulation /

Thesis (Ph. D.)--University of Texas at Austin, 1998. / Vita. Includes bibliographical references (leaves 306-313). Available also in a digital version from Dissertation Abstracts.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/43290584
Date January 1998
CreatorsHenderson, Clifford Lee,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceDigital version accessible at:

Page generated in 0.0014 seconds