Technology development and study of rapid thermal CVD high-K gate dielectrics and CVD metal gate electrode for future ULSI MOSFET device integration zirconium oxide, and hafnium oxide /

Description

Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.

Links & Downloads

1. http://www.lib.utexas.edu/etd/r/d/2003/leec032/leec032.pdf#page=3
2. http://wwwlib.umi.com/cr/utexas/fullcit?p3118036

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/55223772
Date	January 2003
Creators	Lee, Choong-ho.
Source Sets	OCLC
Language	English
Detected Language	English