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Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography /

Thesis (M.S.)--Rochester Institute of Technology, 2010. / Typescript. Includes bibliographical references (leaves 45-47).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/567643137
Date January 2010
CreatorsBaylav, Burak.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis.

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