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Statistical analysis of electromigration lifetimes and void evolution in Cu interconnects

Thesis (Ph. D.)--University of Texas at Austin, 2005. / Supervisor: Paul S. Ho. Vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/61224527
Date January 2005
CreatorsHauschildt, Meike. Ho, P. S.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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