Contamination aspects in integrating high dielectric constant and ferroelectric materials into CMOS processes

Description

Erlangen, Nürnberg, Univ., Diss., 2002. / Computerdatei im Fernzugriff.

Links & Downloads

1. http://www.opus.ub.uni-erlangen.de/opus/volltexte/2004/12/pdf/Thesis.pdf
2. http://www.opus.ub.uni-erlangen.de/opus/volltexte/2004/12/index.html
3. http://deposit.ddb.de/cgi-bin/dokserv?idn=971989001

Tags

RAM

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/637392337
Date	January 1900
Creators	Boubekeur, Hocine.
Publisher	[S.l.] : [s.n.],
Source Sets	OCLC
Language	Undetermined
Detected Language	English