Characterisation of step coverage by pulsed-pressure metalorganic chemical vapour deposition : titanium dioxide thin films on 3-D micro- and nano-scale structures : a thesis submitted in partial fulfilment of the requirements for the degree of Doctor of Philosophy in Mechanical Engineering at the University of Canterbury, Christchurch, New Zealand /

Description

Thesis (Ph. D.)--University of Canterbury, 2010. / Typescript (photocopy). Includes bibliographical references (p. 196-206). Also available via the World Wide Web.

Links & Downloads

1. http://hdl.handle.net/10092/3615

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/639930127
Date	January 2010
Creators	Siriwongrungson, Vilailuck.
Source Sets	OCLC
Language	English
Detected Language	English