碩士 / 國立中興大學 / 精密工程學系所 / 103 / Hard coating by using physical vapor deposition method has been widely used in surface engineering over the past few decades, The well-studied TiN film and TaN film and TiAlN film have been widely used in industry and semiconductor devices as well.
Within the investigated, TiN film was deposited on Si substrate by using an DC sputtering system. With variated N2/Ar flow ratio which are 1/1 and 1/5 and 1/9 respectively to obtain three kinds of different TiN films, and using energy dispersive spectrometers to analysis weight percentage of TiN films. The results are TiN0.18- TiN0.33. And then measure mechanical properties of TiN films with respect to by using bulge test. The movement principle of bulge test is to apply stress on TiN film and measured the difference in height by using laser light and position sensing detector system. With the pressure–deflection curve , the residual stress and Young’s modulus can be determined using this method.
| Identifer | oai:union.ndltd.org:TW/103NCHU5693019 |
| Date | January 2015 |
| Creators | Chien-Hua Chen, 陳建華 |
| Contributors | 林明澤 |
| Source Sets | National Digital Library of Theses and Dissertations in Taiwan |
| Language | zh-TW |
| Detected Language | English |
| Type | 學位論文 ; thesis |
| Format | 56 |
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