A Study of On-chip In-Situ Chamber Recorders for Plasma Induced Damage Effect in Advanced FinFET Technologies / 鰭式電晶體技術下電漿感應充電效應之偵測與記錄

碩士 / 國立清華大學 / 電子工程研究所 / 104 / 因申請專利緣故,資料延後公開

Identiferoai:union.ndltd.org:TW/104NTHU5428027
Date January 2016
CreatorsTsai, Yi Pei, 蔡宜霈
ContributorsChrong Jung Lin, 林崇榮
Source SetsNational Digital Library of Theses and Dissertations in Taiwan
Languagezh-TW
Detected LanguageEnglish
Type學位論文 ; thesis
Format74

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