45nm High-k / Metal Gate process pilot-run procedure improvement / 45奈米 高介電材料/金屬閘極製程之新產品試生產流程改善

碩士 / 國立成功大學 / 電機工程學系碩士在職專班 / 105

Identiferoai:union.ndltd.org:TW/105NCKU5442119
Date January 2017
CreatorsChou-ChiehChen, 陳周傑
ContributorsHong-Tzer Yang, Shoou-Jinn Chang, 楊宏澤, 張守進
Source SetsNational Digital Library of Theses and Dissertations in Taiwan
Languagezh-TW
Detected LanguageEnglish
Type學位論文 ; thesis
Format34

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