A Study of New Plasma Induced Damage Recorder and Charge Splitting Characteristic by Advanced FinFET Logic CMOS Technology / 應用於先進鰭式電晶體邏輯製程之新型電漿充電損害記錄元件暨電荷分離記錄特性之研究

Description

碩士 / 國立清華大學 / 電子工程研究所 / 105 / abstract hide

Links & Downloads

1. http://ndltd.ncl.edu.tw/handle/878g4q

Additional Fields

Identifer	oai:union.ndltd.org:TW/105NTHU5428038
Date	January 2017
Creators	Hsieh, Ting-Huan, 謝定寰
Contributors	King, Ya-Chin, 金雅琴
Source Sets	National Digital Library of Theses and Dissertations in Taiwan
Language	zh-TW
Detected Language	English
Type	學位論文 ; thesis
Format	83