Deposition and Annealing Processes of Gate Stacks on 16 nm FinFETs / 十六奈米鰭式電晶體閘堆疊之沉積與退火製程影響研究

碩士 / 國立清華大學 / 工程與系統科學系 / 105 / abstract hide

Identiferoai:union.ndltd.org:TW/105NTHU5593018
Date January 2017
CreatorsLin, Chih-Ju, 林志儒
ContributorsChangLiao, Kuei-Shu, 張廖貴術
Source SetsNational Digital Library of Theses and Dissertations in Taiwan
Languagezh-TW
Detected LanguageEnglish
Type學位論文 ; thesis
Format104

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