N/F Incorporated High-k Gate Dielectric and SiGe Buried Channel on Electrical Characteristics of FinFET / 氮/氟置入高介電閘極介電層及矽鍺掩埋式通道對鰭式電晶體之電特性影響

Description

碩士 / 國立清華大學 / 工程與系統科學系 / 107

Links & Downloads

1. http://ndltd.ncl.edu.tw/handle/e26jte

Additional Fields

Identifer	oai:union.ndltd.org:TW/107NTHU5593004
Date	January 2018
Creators	Tsai, Shang-Fu, 蔡尚甫
Contributors	ChangLiao, Kuei-Shu, 張廖貴術
Source Sets	National Digital Library of Theses and Dissertations in Taiwan
Language	zh-TW
Detected Language	English
Type	學位論文 ; thesis
Format	84