The Device Performance and Reliability Study on N-type Multi-Fin FinFET Structure by Adopting Metal Gate Multi Work Function Thickness Engineering / 功函數金屬厚度調變對 N 型多重鰭數鰭式場效電晶 體之元件特性和可靠度研究

Description

碩士 / 國立高雄大學 / 電機工程學系碩博士班 / 107

Links & Downloads

1. http://ndltd.ncl.edu.tw/handle/wyhsn6

Additional Fields

Identifer	oai:union.ndltd.org:TW/107NUK00442020
Date	January 2019
Creators	LIN,WEN-CHIN, 林文欽
Contributors	YEH,WEN-KUAN, 葉文冠
Source Sets	National Digital Library of Theses and Dissertations in Taiwan
Language	zh-TW
Detected Language	English
Type	學位論文 ; thesis
Format	100