Two methods of dielectric characterization are presented that offer quick and cost-effective solutions for screening complex dielectric material properties. Through Direct-Print Additive Manufacturing (DPAM) methods, a dielectric material of choice is dispensed into a capacitor structure and characterized through 1-port s-parameter measurements. The presented methods use fixtures that are modeled and validated through simulation then implemented in practice. Advanced simulations are performed to gain insights which are used to optimize the dielectric characterization performance of the fixtures. Additional investigations are performed which investigate the durability of the fixture and material within by exposing the combination to rough environmental conditions for an extended duration. The presented capacitor structures are investigated to characterize dielectric materials within the bandwidth of 0.1-15 GHz, saving the time and effort required in using multiple dielectric characterization methods that cover the same bandwidth. Both methods are compared based on the results for each method achieved in practice while considering the process required perform each method. The pros and cons of the presented characterization methods are weighed which highlights the key aspects for successfully characterizing dielectric materials with each method as well as revealing the potential limitations associated with each.
| Identifer | oai:union.ndltd.org:USF/oai:scholarcommons.usf.edu:etd-8582 |
| Date | 12 July 2018 |
| Creators | York, Seth |
| Publisher | Scholar Commons |
| Source Sets | University of South Flordia |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | Graduate Theses and Dissertations |
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