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The low temperature oxidation of single crystal silicon in a gaseous plasma

No description available.
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:234801
Date January 1987
CreatorsBarlow, K. J.
PublisherUniversity of Liverpool
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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