Return to search

Argon and argon-chlorine plasma reactive ion etching and surface modification of transparent conductive tin oxide thin films for high resolution flat panel display electrode matrices

No description available.
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:243741
Date January 1997
CreatorsMolloy, James
PublisherUniversity of Ulster
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

Page generated in 0.0023 seconds