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Integration of oxynitride barriers by reactive RF sputtering for use in magnetic tunnel junctions

Magnetic field sensors were developed with use of a SFI Shamrock sputtering tool. GMR spin-valve type sensors were developed in CIP geometry requiring no additional processing once deposited, and TMR magnetic tunnel junctions were developed in CPP. This meant the additional development of a photolithographic process in order to produce working devices. The MTJs used MgO as a tunneling barrier in reference devices, and a novel oxynitride barrier in experimental devices deposited by reactive RF sputtering from an elemental target in a variable argon/oxygen/nitrogen atmosphere. Devices produced show potential for further development.

Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:675949
Date January 2014
CreatorsAtcheson, Gwénaël Yves Peter
PublisherQueen's University Belfast
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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