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Epitaxial growth of La-Ca-Mn-O thin films with ultra-sharp metal-insulator transition =: 外延生長金屬--絶緣轉變非常明顯的La-Ca-Mn-薄膜. / 外延生長金屬--絶緣轉變非常明顯的La-Ca-Mn-O薄膜 / Epitaxial growth of La-Ca-Mn-O thin films with ultra-sharp metal-insulator transition =: Wai yan sheng chang jin shu--jue yuan zhuan bian fei chang ming xian de La-Ca-Mn-O bo mo. / Wai yan sheng chang jin shu--jue yuan zhuan bian fei chang ming xian de La-Ca-Mn-O bo mo

by Leung Chi Hung. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1999. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / by Leung Chi Hung. / Acknowledgments --- p.i / Abstract --- p.ii-iii / Table of Contents --- p.iv-v / Figures Caption --- p.vi-xii / Tables Caption --- p.xiii / Chapter 1. --- Introduction / Chapter 1.1 --- "Magnetoresistance (MR),Giant Magnetoresistance (GMR),Colossal Magnetoresistance (CMR) and Their Applications" --- p.1-1 / Chapter 1.2 --- Colossalmagnetoresistance Effect in LCMO --- p.1-5 / Chapter 1.3 --- Significance of Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Film --- p.1-12 / Chapter 1.4 --- The Use of Silver in the YBCO --- p.1-14 / Chapter 1.5 --- Previews --- p.1-15 / Chapter 1.6 --- References --- p.1-17 / Chapter 2. --- Epitixial Growth of Single-Crystal LCMO Thin Film by FTS method / Chapter 2.1 --- Facing-Target Sputtering Method --- p.2-1 / Chapter 2.2 --- Fabrication of LCMO Targets --- p.2-4 / Chapter 2.3 --- Deposition of the LCMO Thin Film / Chapter 2.3.1 --- Deposition Condition --- p.2-6 / Chapter 2.3.2 --- Deposition Process --- p.2-9 / Chapter 2.4 --- X-ray Diffraction Studies and Surface Morphology --- p.2-11 / Chapter 2.5 --- M-S Transition of LCMO Thm Film --- p.2-15 / Chapter 2.6 --- Discussions --- p.2-19 / Chapter 3. --- The Role of Silver in LCMO / Chapter 3.1 --- Reaction between Ag and LCMO --- p.3-1 / Chapter 3.2 --- Grain Size and Transition Temperature in Bulk LCMO --- p.3-9 / Chapter 3.3 --- Improving the Sharpness of Metal - Semiconductor Transition and Crystallinity of LCMO Film --- p.3-15 / Chapter 3.4 --- Stabilization of the LCMO Structure --- p.3-21 / Chapter 3.5 --- Discussions --- p.3-25 / Chapter 4 --- Epitaxial Growth of the Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Film / Chapter 4.1 --- Synthesis Process of the Ultra-Sharp Metal-Semiconductor Transition LCMO Thin Films --- p.4-1 / Chapter 4.2 --- Resistivity and Magnetoresistance --- p.4-6 / Chapter 4.3 --- Thermal Annealing Effects / Chapter 4.3.1 --- Oxygen Annealing Effect --- p.4-15 / Chapter 4.3.1 --- High Pressure Annealing Effect --- p.4-20 / Chapter 4.3.2 --- Vacuum Annealing Effect --- p.4-23 / Chapter 4.4 --- Surface Morphology and Characterization --- p.4-27 / Chapter 4.5 --- Discussions --- p.4-37

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_322761
Date January 1999
ContributorsLeung, Chi Hung., Chinese University of Hong Kong Graduate School. Division of Physics.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, 1 v. (varios paing) : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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