by Sin Lai Yi, Mandy. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references (leaves 120-121). / Text in English; abstracts in English and Chinese. / by Sin Lai Yi, Mandy. / Abstract --- p.ii / 論文摘要 --- p.iii / Acknowledgements --- p.iv / Table of Contents --- p.v / List of Figures --- p.ix / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Adhesion --- p.1 / Chapter 1.2 --- Adhesion issues in PLEDs --- p.1 / Chapter 1.3 --- Literature review of the adhesion measurement techniques --- p.4 / Chapter 1.3.1 --- Methods involving detachment normal to the interface --- p.4 / Chapter 1.3.1.1 --- Direct pull-off method --- p.5 / Chapter 1.3.2 --- Methods based upon the application of lateral stresses for detachment --- p.7 / Chapter 1.3.2.1 --- Scotch tape method --- p.7 / Chapter 1.3.2.2 --- Peel test --- p.8 / Chapter 1.4 --- Motivations and aims of studies --- p.11 / Chapter 1.5 --- Outline of the thesis --- p.12 / Chapter Chapter 2 --- Experimental and Instrumentation / Chapter 2.1 --- Sample preparation --- p.13 / Chapter 2.2 --- Instrumentation --- p.13 / Chapter 2.1.1 --- Modified Scotch tape method --- p.13 / Chapter 2.2.2 --- Atomic force microscope --- p.23 / Chapter 2.2.3 --- X-ray photoelectron spectroscopy --- p.26 / Chapter 2.2.4 --- Radio-frequency (RF) plasma etching system --- p.27 / Chapter Chapter 3 --- Verification of the modified Scotch tape method / Chapter 3.1 --- Introduction --- p.31 / Chapter 3.2 --- Verification Test One ´ؤ Measurement against different adhesive tapes --- p.31 / Chapter 3.3 --- Verification Test Two ´ؤ Measurement with different crosshead speeds --- p.40 / Chapter 3.4 --- Verification Test Three ´ؤ Measurement of adhesive tapes with different sizes --- p.46 / Chapter 3.5 --- Summary --- p.51 / Chapter Chapter 4 --- Adhesion of gold films coated on the plasma treated ITO / Chapter 4.1 --- Introduction --- p.53 / Chapter 4.2 --- Characteristics of RF plasma etching --- p.53 / Chapter 4.2.1 --- Test One ´ؤ Study the relationship between sputtering time and sputtering depth --- p.54 / Chapter 4.2.2 --- Test Two - Study the relationship beteen self-bias voltage and sputtering depth --- p.54 / Chapter 4.3 --- Modification of the surface morphology of the Ar plasma treated ITO --- p.57 / Chapter 4.4 --- Quantitative adhesion measurement of gold films on plasma treated ITO --- p.62 / Chapter 4.5 --- Summary --- p.68 / Chapter Chapter 5 --- Adhesion of PFO on ITO with self-assembled monolayers as interfacial layers / Chapter 5.1 --- Introduction --- p.69 / Chapter 5.2 --- Reactions between SAMs and ITO --- p.71 / Chapter 5.3 --- Sample preparation --- p.73 / Chapter 5.4 --- Tests of alkylsilane --- p.74 / Chapter 5.4.1 --- Determination of the point of film detachment --- p.74 / Chapter 5.4.2 --- Adhesion test of PFO/alkylsilane/ITO --- p.79 / Chapter 5.4.3 --- Adhesion test of PF0/alkylsilane/Si02 --- p.91 / Chapter 5.5 --- Tests of phenylsilane --- p.104 / Chapter 5.6 --- Summary --- p.114 / Chapter Chapter 6 --- Conclusions and further studies / Chapter 6.1 --- Conclusions --- p.116 / Chapter 6.2 --- Further studies --- p.118 / References --- p.120
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_323798 |
| Date | January 2002 |
| Contributors | Sin, Lai Yi., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xiii, 121 leaves : ill. (some col.) ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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