<p> Thick-film resistors are being used in the hybrid microelectronics
industry. One characteristic that has been considered
for the thick film resistor i s the reproduceability in resistor
value associated with the production techniques employed in the
reproduceability in resistor value associated with the production
techniques employed in the resistor manufactured. </p> <p> One parameter that has been associated with reproduceability
is the yield figure; another parameter is the width of the resistance
distribution for a given resistor production. These parameters
can be used to identify the degree of reproduceability for the
resistor production. A high yield figure or a small spread figure
indicates a high degree of reproduceability. </p> <p> The effect of aspect ratio and sheet resistivity on the reproduceability
has been evaluated for paste system A. Aspect ratios of
10, 5, 2 and 0.7 for a range of sheet resistivities (100, 1K, 10K,
100K, and 1M ohms per square) were investigated. Results show that
for a given aspect ratio the amount of variation in spread for the
range of sheet resistivities is negligible within the limits of
error in the experiment. For a given sheet resistivity, the variation
in spread for the range of aspect ratios is considerable. The
spread of an aspect ratio of 10 is 25 ± 4%. For an aspect ratio of
0.7 the spread is 59± 7%. </p> <p> The effect of resistor location on spread for a 2" x 2" substrate
has been studied. Results indicate that a higher degree of
reproduceability can be associated with resistors located near the
central (1" x 1") region of the substrate than the resistors located near the perimeter. </p> <p> The effect of increasing the resistor width on the reproduceability
has been evaluated for resistors having aspect ratios near
unity. Results show that as the resistor width is increased the
spread in resistance decreases. For a width of 30 mil the spread
in resistance is 37%. When the width is increased to 100 mil,
the spread decreases to 21%. </p> / Thesis / Master of Engineering (MEngr)
| Identifer | oai:union.ndltd.org:mcmaster.ca/oai:macsphere.mcmaster.ca:11375/19793 |
| Date | January 1974 |
| Creators | Molson, L. |
| Contributors | Harms, A.A., Engineering Physics |
| Source Sets | McMaster University |
| Language | English |
| Detected Language | English |
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