A simple, low-cost plasma reactor was developed for the purpose of carrying out thin film deposition experiments. The reactor is based largely on the Atmospheric Pressure Nonequilibrium Plasma (APNEP) design with a simple modification. It was used in an attempt to fabricate magnesium diboride thin films via a novel, but unsuccessful CVD process where plasma etching provides a precursor boron flux. Carbon nanotubes were successfully synthesised with the apparatus using a plasma-based variation of the floating catalyst or vapour phase growth method. The affect of various parameters and chemicals on the quality of nanotube production was assessed. / Thesis (M.Sc.Eng.)-University of KwaZulu-Natal, Durban, 2004.
| Identifer | oai:union.ndltd.org:netd.ac.za/oai:union.ndltd.org:ukzn/oai:http://researchspace.ukzn.ac.za:10413/4307 |
| Date | January 2004 |
| Creators | Coetsee, Dirk. |
| Contributors | Jarvis, Alan Lawrence Leigh., Doyle, Terence B. |
| Source Sets | South African National ETD Portal |
| Language | English |
| Detected Language | English |
| Type | Thesis |
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