Proposed diploma thesis is focused on preparation and characterization of the plasma polymer thin films based on tetravinylsilane monomer (TVS). Plasma enhanced chemical vapour deposition (PECVD) method involving pulse and continual plasma discharge modes were used for thin film deposition on silicon wafer pieces. Reactive plasma composition was containing pure TVS or mixtures of TVS and argon or oxygen gas. Atomic force microscopy was used for surface topography and roughness characterization. Cyclic nanoindentation was involved to measurements to determine the Young’s modulus and hardness of prepared films and scratch test was performed to evaluate the degree of adhesion. Special attention was drawn to the characterization of films with a Young’s modulus below 10 GPa. Tip geometry of indenter influence on scratch test was also commented. Surface and mechanical properties of thin films in relation to the deposition conditions were correlated to the obtained results and final analysis of deposition conditions influence is proposed.
| Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:240521 |
| Date | January 2016 |
| Creators | Plichta, Tomáš |
| Contributors | Klapetek, Petr, Čech, Vladimír |
| Publisher | Vysoké učení technické v Brně. Fakulta chemická |
| Source Sets | Czech ETDs |
| Language | Czech |
| Detected Language | English |
| Type | info:eu-repo/semantics/masterThesis |
| Rights | info:eu-repo/semantics/restrictedAccess |
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