This work focuses on the growth of vertically aligned CdTe nanowire arrays of controllable diameter and length using cathodic electro deposition in anodized alumina templates. This step was followed by annealing at 250° C in a reducing environment (95% Ar + 5% H2). AAO template over ITO-glass was used as starting template for the device fabrication. The deposited nanowires showed nanocrystalline cubic phase structures with a strong preference in [111] direction. First gold (Au) was deposited into AAO using cathodic electro deposition. This was followed by CdTe deposition into the pore. Gold was deposited first as it aids the growth of CdTe inside AAO and it makes Schottky contact with the deposited n type CdTe. CdTe was determined to be n-type from the fact that back to back diode was obtained with Au-CdTe-Au test structure. Aluminum (Al) was sputtered on the top to make the ohmic contact to the n type CdTe deposited in AAO. Analysis of Schottky diodes yielded a diode ideality factor of 10.03 under dark and 10.08 under light and reverse saturation current density of 34.9μA/cm2 under dark and 39.7μA/cm2 under light.

The focus of this thesis is on radio frequency magnetron sputtered aluminum oxide thin films developed for use as the gate dielectric for organic thin film transistors. The effect of top metal electrodes on the electrical characteristics of aluminum oxide metal-insulator-metal capacitors has been studied to determine an optimum material combination for minimizing the leakage current, while maximizing the breakdown field. The leakage current and breakdown characteristics were observed to have a strong dependence on the top electrode material. Devices with Al top electrodes exhibited significantly higher breakdown voltages compared to devices with Au, Ni, Cu and Ag electrodes. Introducing an Al diffusion barrier dramatically increased the breakdown field and reduced the leakage current for capacitors with Ag, Au and Cu top electrodes. The electrical characteristics were found to relate well to material properties, of the contacting metals, such as ionization potential and diffusion coefficient.

The focus of this thesis is on radio frequency magnetron sputtered aluminum oxide thin films developed for use as the gate dielectric for organic thin film transistors. The effect of top metal electrodes on the electrical characteristics of aluminum oxide metal-insulator-metal capacitors has been studied to determine an optimum material combination for minimizing the leakage current, while maximizing the breakdown field. The leakage current and breakdown characteristics were observed to have a strong dependence on the top electrode material. Devices with Al top electrodes exhibited significantly higher breakdown voltages compared to devices with Au, Ni, Cu and Ag electrodes. Introducing an Al diffusion barrier dramatically increased the breakdown field and reduced the leakage current for capacitors with Ag, Au and Cu top electrodes. The electrical characteristics were found to relate well to material properties, of the contacting metals, such as ionization potential and diffusion coefficient.

Thesis--University of Oklahoma. / Bibliography: leaves 81-83.

Mémoire (M.Eng.)--Université du Québec à Chicoutimi, 1996. / Document électronique également accessible en format PDF. CaQCU

Thesis (M.S.)--University of Michigan, 2003. / Includes bibliographical references.

Thesis (Ph. D.)--Oregon State University, 2009. / Printout. Includes bibliographical references (leaves 165-173). Also available on the World Wide Web.

Thesis (M.S.D.)--Indiana University School of Dentistry, 2010 / Title from PDF t. p. (viewed May 12, 2010) Advisor(s): Michael A. Cochran, Chair of the Research Committee, Jeffrey A. Platt, Bruce A. Matis, Carlos Gonzalez-Cabezas, Sopanis D. Cho. Curriculum vitae. Includes abstract. Includes bibliographical references (leaves 64-69).

Thesis (Ph. D.)--Ohio State University, 2005. / Title from first page of PDF file. Includes bibliographical references (p. 152-160).

Orientador: Elidiane Cipriano Rangel / Banca: Rogerio Valentim Gelamo / Banca: Sandro Doninini Mancini / O programa de Pós graduação em Ciência e Tecnologia de Materiais, PosMat, tem carater institucional e integra as atividades de pesquisa em materiais de diversos campi da UNESP / Resumo: Filmes finos de alumina vêm sendo amplamente estudados em função de suas propriedades físicas e químicas. Em aplicações industriais, filmes de alumina são utilizados, por exemplo, em ferramentas de corte e em circuitos microeletrônicos. Neste trabalho empregou-se o processo de PECVD (do inglês, Plasma Enhanced Chemical Vapor Deposition) para sintetizar fimes contendo óxido de alumínio. Os filmes foram depositados a partir de plasmas excitados por radiofrequencia (13,56 MHz) em misturas de acetilacetonato de alumínio e argônio. Uma configuração experimental inédita foi empregada para permitir a incorporação de alumínio nos filmes: o pó do organometálico foi colocado diretamente no eletrodo por onde um plasma de argônio foi excitado. A pulverização catódica aliada a sublimação do organometálico faz com que haja, em determinadas condições, a deposição de filmes contendo alumina. Foram avaliados os efeitos da pressão do plasma e da potência do sinal de excitação nas propriedades dos filmes resultantes. A técnica de perfilometria foi utilizada para determinar a espessura da camada depositada. Difração de raios X (DRX), com a incidência de ângulos rasantes, foi empregada para investigar a estrutura do material. As técnicas de espectroscopia de absorção no infravermelho por transformada de Fourier (FTIR) e espectroscopia de energia dispersiva (EDS) foram respectivamente utilizadas para analisar a estrutura e a composição química dos filmes. A morfologia das amostras preparadas sobre aço-inoxidável foi analisada por microscopia eletrônica de varredura (MEV) enquanto a dureza foi avaliada por nanoindentação. Foram obtidos filmes amorfos com espessuras de até 7 μm que contêm carbono, alumínio, oxigênio e hidrogênio. Observou-se que as proporções de alumínio e carbono são altamente dependentes da energia cinética dos íons presentes no plasma... (Resumo completo, clicar acesso eletrônico abaixo) / Abstract: Recently aluminium oxide thin films have been widely studied due to their important physical and chemical properties. Depositions in cutting tools and in microelectronic circuits are examples of industrial applications of industrial applications of aluminum oxide films. In this work, alumina-containing films were prepared by PECVD (Plasma Enhanced Chemical Vapor Deposition) using a new configuration of the plasma system; the metalorganic powder was placed directly on the powered electrode while the substrates were mounted on the grounded topmost electrode. The plasma was excited by applying radiofrequency (13.56 MHz) power to the lower electrode in an argon atmosphere. The sputtering combined with the sublimation of organometallic compound enabled the growth of an alumina-containing organic layer. The effect of the plasma excitation parameters on the properties of the resulting films was studied. Film thickness was measured using profilometry. Grazing angle incidence X-ray diffractometry (GAXRD) was used to determine the structure of the films. Fourier trasnform Infrared Spectroscopy (FTIR) and energy dispersive spectroscopy (EDS) techniques were used to analyze chemical structure and coposition, respectively. The surface morphology was analyzed by scanning electron microscopy (SEM) while film hardness was evaluated by nanoindentation Amorphous organic films were deposited with thicknesses of up to 7 μm. The films were composed of aluminum, carbon, oxygen and hydrogen, the proportions of carbon and aluminum being strongly dependent on the kinetic energy of the ions. The film surface was uniform but presented particulares and, in some cases, wrinkles. The proportion of such defects depends on the plasma excitation parameters / Mestre