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The effect of process parameters on the properties of diamond-like carbon thin filmChen, Jyun-Jia 28 July 2010 (has links)
Since the diamond like carbon features include high hardness and high wear resistance, low friction coefficient, chemical inertness, high resistance, low dielectric constant, the IR Transparency and field emission. The process of Diamond carbon film was usually by CVD or PVD techniques. However, high substrate temperature or low deposition rate and the can not make large area of films leads to limit the applications of diamond like film. Electrodeposition method is an innovative method to prepare DLC film and it meets these demands such as: equipment cheap, high deposition rate and larger area coatings.
In this paper, ITO substrate was used for electrodeposition the diamond-like carbon films and to evaluate the possibility for the large area of DLC films.For the process of electrical deposition, the electrolyte consists of acetic acid and DI water mixed in different proportions. The deposition process were conditioned as: electrolyte concentration between 0.01% and 0.8%; voltage from 2.1V to 50V; growth temperature in the range of 300C ~ 850C. In addition, by using the control variables method, the deposition parameters including voltage, deposition temperature and solution concentration of electrolyte were varied to evaluate the characteristics and quality of diamond-like carbon films. The n & k film analyzer (n & k Analyze), X ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM) were used to characterize the surface morphology, microstructure and compositional analysis.
The reflectivity, transmittance, and refractive index of DLC Films were revealed by the n & k analyzer. Hence, the best conditions used for anti-reflective layer and projections Eopg can be achieved. For SEM analysis, the DLC film with uniformity surface structure can be found. Additionally, the current - time graph can be used to predict the properties of film varied with the applied voltage, percent of concentrations, growth temperature etc.. The microstructure of DLC film was investigated by the XPS measurement; the sp2 / sp3 ratio varies from the growth parameters changes. The hydrogen content of DLC films was obtained by FTIR measurements, the contents decrease as the operating voltage, electrolyte concentration and the substrate temperature increase. As for the DLC deposited on ITO glass as an anti-reflective layer, the experimental results showed that DLC film can reduce the reflectivity from 40% to 70%.
Finally, the results obtained show a reasonable match for various measurements. T he characteristics of DLC films also shows that it very depends on the deposited parameters and the relationship beteen them was discussed in detailed. Some of the advance study will be investigated in future.
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