51 |
Cost analysis on the use of chamber cleaning agents nitrogen trifluoride and chlorine trifluoride in the semiconductor industryEmmerich, Jodi. January 1999 (has links) (PDF)
Thesis, PlanB (M.S.)--University of Wisconsin--Stout, 1999. / Includes bibliographical references.
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52 |
Surface investigations of the atomic layer growth mechanism in aluminum nitride thin film deposition using dimethylethylamine alane and ammonia /Kuo, Jason Se-Yung. January 1999 (has links)
Thesis (Ph. D.)--University of Washington, 1999. / Vita. Includes bibliographical references (leaves [103]-112).
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53 |
Simultaneous approach to model building and process design using experimental design application to chemical vapor deposition /Wissmann, Paul J.. January 2008 (has links)
Thesis (Ph.D)--Chemical Engineering, Georgia Institute of Technology, 2009. / Committee Chair: Grover, Martha; Committee Member: Garmestani, Hamid; Committee Member: Hess, Dennis; Committee Member: McDowell, David; Committee Member: Nenes, Athanasios; Committee Member: Realff, Matthew. Part of the SMARTech Electronic Thesis and Dissertation Collection.
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54 |
Mechanistic, surface chemistry, and growth studies of novel precursors for aluminum nitride thin films /Robinson, David Walter. January 1999 (has links)
Thesis (Ph. D.)--University of Washington, 1999. / Vita. Includes bibliographical references (leaves 167-187).
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55 |
The use of plasma-generated silicon dioxide-like coatings as charge storage media for electrets /Lin, Xiaorong. January 1993 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1993. / Typescript. Includes bibliographical references (leaves 79-80).
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56 |
Synthesis, structure, and reactivity of some heavier main group compounds /McBurnett, Brian Gordon, January 1998 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1998. / Vita. Includes bibliographical references. Available also in a digital version from Dissertation Abstracts.
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57 |
Deposition of gate quality dielectrics for Si/Si-Ge heterostructure devices using remote plasma chemical vapor deposition /Sharma, Rajan, January 1999 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 140-145). Available also in a digital version from Dissertation Abstracts.
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58 |
Fabrication and characterization of MOCVD grown AIInAs/GaInAs high electron mobility transistors /Ng, Kai Lun. January 2010 (has links)
Includes bibliographical references (p. 46-51).
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59 |
SiC Growth by Laser CVD and Process AnalysisMi, Jian. January 2006 (has links)
Thesis (Ph. D.)--Mechanical Engineering, Georgia Institute of Technology, 2006. / Lackey, W. Jack, Committee Chair ; Cochran, Joe K., Committee Member ; Danyluk, Steven, Committee Member ; Fedorov, Andrei G., Committee Member ; Rosen, David W., Committee Member ; Wang, Zhonglin, Committee Member.
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60 |
Nitrogen incorporation in nanodiamond depositionTsui, Kin Chung. January 2005 (has links) (PDF)
Thesis (M.Sc.)--City University of Hong Kong, 2005. / At head of title: City University of Hong Kong, Department of Physics and Materials Science, Master of Science in materials engineering & nanotechnology dissertation. Title from title screen (viewed on Sept. 4, 2006) Includes bibliographical references.
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