Spelling suggestions: "subject:"cathode sputtering (ablating process)"" "subject:"cathode sputtering (achelating process)""
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Fabrication of a thin film resistance heaterSathya, Santhana. January 1999 (has links)
Thesis (M.S.)--Ohio University, August, 1999. / Title from PDF t.p.
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Adhesion of sputtered copper to plasma-treated polyimide substances /Ma, Jong-Bong. January 1991 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 1991. / Typescript. Includes bibliographical references.
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Adhesion of copper to photo-oxidized polyimides /Razdan, Mayuri. January 2008 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 2008. / Typescript. Includes bibliographical references (leaves 56-58).
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Properties and characterisation of sputtered ZnO : a thesis presented for the degree of Doctor of Philosophy in Electrical and Computer Engineering at the University of Canterbury, Christchurch, New Zealand /Schuler, Leo P. January 1900 (has links)
Thesis (Ph. D.)--University of Canterbury, 2008. / Typescript (photocopy). "November 2008." Includes bibliographical references (p. [144]-149). Also available via the World Wide Web.
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Effects of sputter deposition parameters on stress in tantalum films with applications to chemical mechanical planarization of copper /Perry, Jeffrey L. January 2004 (has links)
Thesis (M.S.)--Rochester Institute of Technology, 2004. / Typescript. Includes bibliographical references (leaves 74-76).
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Preparation and characterization of granular magnetic cobalt silver thin film.January 2000 (has links)
by Chiah Man Fat. / Thesis submitted in: September 1999. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2000. / Includes bibliographical references (leaves 94-97). / Abstracts in English and Chinese. / Acknowledgements --- p.2 / Abstract --- p.3 / Table of Contents --- p.5 / List of Figures --- p.7 / List of Tables --- p.13 / Chapter Chapter 1 --- Introduction --- p.14 / Chapter 1.1. --- Overview --- p.14 / Chapter 1.2. --- Giant Magnetoresistance (GMR) --- p.15 / Chapter 1.3. --- Application of GMR Materials --- p.20 / Chapter 1.4. --- Preparation Methods --- p.22 / Chapter 1.5. --- This Thesis --- p.23 / Chapter Chapter 2 --- Sample Preparation and Experimental Methods --- p.24 / Chapter 2.1. --- MEVVA Ion Source Implanter --- p.24 / Chapter 2.2. --- The Pulsed Filtered Cathodic Arc Co-deposition System --- p.26 / Chapter 2.3. --- Sample Preparation --- p.29 / Chapter 2.3.1 --- Implantation Condition --- p.29 / Chapter 2.3.2 --- Co-deposition Conditions --- p.31 / Chapter 2.4. --- Characterization methods --- p.32 / Chapter 2.4.1 --- Magnetoresistance Measurement --- p.32 / Chapter 2.4.2 --- Atomic Force Microscopy and Magnetic Force Microscopy --- p.34 / Chapter 2.4.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.37 / Chapter 2.4.4 --- SQUID Magnetometer --- p.38 / Chapter Chapter 3 --- Characterization of Implanted Samples --- p.39 / Chapter 3.1. --- Introduction --- p.39 / Chapter 3.2. --- Results and Discussion --- p.39 / Chapter 3.2.1 --- Ag Film Thickness Dependence --- p.39 / Chapter 3.2.2 --- Dose Dependence --- p.44 / Chapter 3.2.3 --- Extraction Voltage Dependence --- p.46 / Chapter 3.2.4 --- Annealing Temperature Dependence --- p.49 / Chapter 3.2.5 --- Thicker Layer Formation --- p.56 / Chapter 3.2.6 --- AFM and MFM Measurements --- p.58 / Chapter 3.3. --- Summary --- p.64 / Chapter Chapter 4 --- Characterization of Co-deposited Samples --- p.65 / Chapter 4.1. --- Introduction --- p.65 / Chapter 4.2. --- Results and discussion --- p.65 / Chapter 4.2.1 --- RBS Measurement --- p.65 / Chapter 4.2.2 --- Magnetoresistance Measurement --- p.66 / Chapter 4.2.3 --- AFM Measurement --- p.69 / Chapter 4.2.4 --- MFM Measurement --- p.76 / Chapter 4.3. --- Summary --- p.84 / Chapter Chapter 5 --- Conclusion --- p.85 / Chapter 5.1. --- Main Results of This Work --- p.85 / Chapter 5.2. --- Suggestions on Future Works --- p.87 / Appendix --- p.89 / Reference --- p.94 / Publications --- p.97
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