Laboratory and field studies were conducted to characterize phosphorus in bottom sediments for retention/detention ponds. The laboratory studies, including batch and column experiments, were conducted to assess possible removal processes. Sediment core samples were collected from detention ponds receiving urban runoff. These cores were analyzed for phosphorus at different layers including accumulated top sediments and the lower parent soil beneath it at a depth of 1, 3, 5, 10 and greater than 10 cm. The phosphorus accumulation rate was found to decline with calculated overflow rates from an average storm. Also attenuation of phosphorus with sediment depth followed an exponential decline. Batch experiments showed a higher adsorption capacity to remove phosphorus for top accumulated sediments than the lower parent soil, which is consistent with data from field studies showing greater phosphorus in the sediments. Phosphorus adsorption can be described by the Freundlich and Linear isotherms. Mass transfer rates varied with phosphorus concentration and contact time. A generalized model was developed to predict phosphorus removal in column studies.

This research addresses emissions of hexavalent chromium mist from hard chromium electroplating operations. Most of these emissions are typically captured by a ventilation stack and directed to a pollution control device; those which escape capture are called fugitive emissions. Releases of toxic materials such as hexavalent chromium must be reported annually to the Environmental Protection Agency (EPA) under provisions of the Superfund Amendments and Reauthorization Act (SARA) Title III of 1986 via the Toxic Release Inventory (TRI), Form R. The objectives were: (1) to provide estimates of fugitive hexavalent chromium emissions for the completion of Form R; and (2) to develop a predictive model for stack and fugitive emissions versus process and ventilation parameters. The database for stack emissions included published results from EPA studies. Fugitive release data were generated by field characterization at two operating facilities. Supplemental data for stack releases were also obtained during this field activity. The fugitive releases were documented to represent a small portion of the total atmospheric discharge; in most instances, the fugitive releases were less than the detection capability of the sampling/analytical protocols. Stack releases were successfully correlated with a measure of production activity (ampere-hours), production capacity (mass of chromium in the process bath), tank dimensions (plating bath surface area), and ventilation efficiency (ventilation slot area). This effort was supported by the EPA in the form of a cooperative agreement with the American Electroplaters and Surface Finishers Society (AESF).

The objectives of this research were to quantify formaldehyde consumption due to plating and parasitic reactions and determine the magnitude and distribution of formaldehyde losses from the electroless copper plating process. Plating and rinse bath samples obtained from three electroless copper plating operations were analyzed for formaldehyde and copper in order to develop a mass balance analysis about the plating bath for periods of active production and no production. Fugitive air and stack releases of formaldehyde were estimated using emission factors developed from air sampling at the three facilities. It was determined that approximately 90% of the formaldehyde added to the plating process was consumed by some type of chemical reaction. The remaining 10% of formaldehyde represents losses from the plating operation. For the facilities with a waste plating solution stream, atmospheric losses accounted for approximately 25% of the total losses. The mass of fugitive air formaldehyde measured approximately 2.8 times that escaping through the stack. Dragout accounted for approximately 2.3% of the losses with the remaining going to the waste stream. For the facility without a plating solution waste stream, formaldehyde losses were distributed 59% to atmospheric releases and 41% to the rinse tank. Fugitive and stack releases were approximately the same at 29% of the formaldehyde losses. Formaldehyde consumption due to parasitic reactions for periods of active plating and no plating were determined for two facilities. The rate of parasitic consumption during periods of production was found to be approximately 3 times greater than that for no production. The rate of parasitic consumption was observed to increase with increasing bath temperature.

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