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Synthesis and functionalization of large-area graphene and its structural, electrical and electrochemical properties has been investigated. First, the graphene films, grown by thermal chemical vapor deposition (CVD), contain three to five atomic layers of graphene, as confirmed by Raman spectroscopy and high-resolution transmission electron microscopy. Furthermore, the graphene film is treated with CF4 reactive-ion plasma to dope fluorine ions into graphene lattice as confirmed by X-ray photoelectron spectroscopy (XPS) and UV-photoemission spectroscopy (UPS). Electrochemical characterization reveals that the catalytic activity of graphene for iodine reduction enhanced with increasing plasma treatment time, which is attributed to increase in catalytic sites of graphene for charge transfer. The fluorinated graphene is characterized as a counter-electrode (CE) in a dye-sensitized solar cell (DSSC) which shows ~ 2.56% photon to electron conversion efficiency with ~11 mAcm−2 current density. Second, the large scale graphene film is covalently functionalized with HNO3 for high efficiency electro-catalytic electrode for DSSC. The XPS and UPS confirm the covalent attachment of C-OH, C(O)OH and NO3- moieties with carbon atoms through sp2-sp3 hybridization and Fermi level shift of graphene occurs under different doping concentrations, respectively. Finally, CoS-implanted graphene (G-CoS) film was prepared using CVD followed by SILAR method. The G-CoS electro-catalytic electrodes are characterized in a DSSC CE and is found to be highly electro-catalytic towards iodine reduction with low charge transfer resistance (Rct ~5.05 Wcm2) and high exchange current density (J0~2.50 mAcm-2). The improved performance compared to the pristine graphene is attributed to the increased number of active catalytic sites of G-CoS and highly conducting path of graphene. We also studied the synthesis and characterization of graphene-carbon nanotube (CNT) hybrid film consisting of graphene supported by vertical CNTs on a Si substrate. The hybrid film is inverted and transferred to flexible substrates for its application in flexible electronics, demonstrating a distinguishable variation of electrical conductivity for both tension and compression. Furthermore, both turn-on field and total emission current was found to depend strongly on the bending radius of the film and were found to vary in ranges of 0.8 – 3.1 V/μm and 4.2 – 0.4 mA, respectively.

This thesis is a sandwich thesis composed of three papers that are published in refereed journals or conferences. The first paper is a systematic experimental study conducted to identify the first phase to form during cobalt germanidation. Hexagonal β-Co5Ge3 was the first phase to form at temperatures as low as 227°C followed by monoclinic CoGe as the second phase at the same temperature. We also report for the first time that both phases that formed were highly ordered partial epitaxial crystal orientations suggesting that both of those low-temperature phases could potentially serve as high quality contacts for germanium based devices with a very low thermal budget which is advantageous for the process design. Those results contributed to a better understanding of cobalt germanidation leading to the first multiphase technology computer aided design model presented in the second paper. This kinetic model for cobalt germanide growth can predict the resulting phase based on anneal time, temperature, and ambient. The model has been calibrated to experimental results. This predictive model can help in the design of cobalt germanide contacts with low resistance and can serve as a general modeling framework for multiphase solid state reaction binary systems. A comprehensive survey of the experimental results for formation of cobalt germanides is discussed and the data are reconciled in the third paper. Factors affecting the resulting phases and their quality are identified and some optimum choices for the experimental parameters are pointed based on the survey. The role of germanium crystal orientation in ohmic and Schottky properties of the contact is analyzed. Fermi level pinning plays a role mainly on metal/(100) n-type Ge interfaces and its role is minimal on p-type Ge and other crystalline orientations. Schottky Barrier Heights for cobalt germanide contacts reported in the literature are surveyed. Crystalline cobalt germanides, forming when Co is deposited at high temperatures, are expected to have lower interface resistivities compared to those reported. The work is important because contact resistance has become one of the most important factors in advanced complementary metal oxide semiconductor (CMOS) technology and advanced devices already include germanium (Ge) in the source/drain regions of devices. It is also important because heating at the interface due to contact resistance is one of the key challenges in power devices and cobalt germanide can be used both for Si and Ge based devices as well as for gallium nitride (GaN) devices. The latter application is possible because cobalt germanide is lattice-matched to GaN. / Thesis / Doctor of Philosophy (PhD) / The main goal of this thesis is to create predictive empirical, mathematical, and physical models to help the designer of the semiconductor process technology to design high quality electric contacts, namely cobalt germanides, to their semiconductor devices, germanium based. The choice of cobalt germanides is motivated by their expected superior quality given the possibility of growing them in crystalline form. We settled a theoretical and experimental controversy regarding the first phase to form by conducting experiments demonstrating that low-temperature forming cobalt germanide phases are highly ordered and could serve as high quality contacts. A predictive physical based mathematical model was developed to assist the designer in obtaining the desired cobalt germanide phase for its needed electrical properties by design. Factors affecting the quality of the germanide were identified based on an extensive survey and the optimum choices for the parameters to obtain high quality contact were pointed.

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