In this thesis, the effect of surfactants (Bi /Sb) on GaAs(111) is explored, particularly in regards to modifying the surface morphology and growth kinetics. Both molecular beam epitaxy (MBE) and metal-organic chemical vapour deposition (MOCVD) techniques are discussed in this context. InAs/GaAs(111) quantum dots (QDs) have been promoted as leading candidates for efficient entangled photon sources, owing to their high degree of symmetry (c_3v). Unfortunately, GaAs(111) suffers from a defect-ridden homoepitaxial buffer layer, and the InAs/GaAs(111) material system does not natively support Stranski{Krastanov InAs QD growth. Surfactants have been identified as effective tools to alter grown surface morphologies and growth modes, potentially overcoming these obstacles, but have yet to be studied in detail in this context. For MBE, it is shown that Bi acts as a surfactant when employed in GaAs(111) homoepitaxy, and eliminates defects/hillocks, yielding atomically-smooth surfaces with step-flow growth, and RMS roughness values of 0.13 nm. The effect is more pronounced as the Bi flux increases, and Bi is suggested to be increasing adatom diffusion. A novel reflection high energy electron diffraction (RHEED)-based experiment was also designed and performed to measure the desorption activation energy (U_Des) of Bi on GaAs(111), yielding U_Des = 1.74 ± 0.38 eV. GaAs(111) homoepitaxy was also investigated using MOCVD, with GaAs(111)B exhibiting RMS roughness values of 0.09 nm. Sb is shown to provoke a morphological transition from plastically-relaxed 2D to 3D growth for InAs/GaAs(111)B, showing promise in its ability to induce QDs. Finally, simulations for GaAs-based quantum well (QW) photoluminescence were conducted, and such QWs are shown to potentially produce very sharp linewidths of 3.9 meV. These results enhance understanding of Bi surfactant behaviour on GaAs(111) and can open up its use in many technological applications, paving the way for the realization of high efficiency/viable QD entangled photon sources. / Thesis / Master of Applied Science (MASc)