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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Synthesis, characterization and density functional theory investigations of tris-cyclopentadienyl compounds of zirconium and hafnium

Palmer, Erick Joseph, January 2005 (has links)
Thesis (Ph. D.)--Ohio State University, 2005. / Title from first page of PDF file. Document formatted into pages; contains xxiv, 256 p.; also includes graphics (some col.) Includes bibliographical references (p. 242-254). Available online via OhioLINK's ETD Center
2

A study of the reduced states of zirconium and hafnium

Leddy, James Jerome, January 1955 (has links)
Thesis (Ph. D.)--University of Wisconsin--Madison, 1955. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references.
3

Fractional separation of hafnium and zirconium by means of triethyl phosphate

Freund, Harry, Willard, Hobart H. January 1946 (has links)
From H. Freund's Thesis--University of Michigan. / An article, by H.H. Willard and Harry Freund, reprinted from Industrial and engineering chemistry, analytical ed., v. 18, March 15, 1946. Literature cited: p. 9.
4

Studies of the chemistry of hafnium and zirconium

Gammill, Adrian Monroe, January 1951 (has links)
Thesis (Ph. D.)--University of Wisconsin--Madison, 1951. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references.
5

Alizarin sulfonate complexes of zirconium and hafnium

Hirozawa, Stanley Tariho, January 1955 (has links)
Thesis (Ph. D.)--University of Wisconsin--Madison, 1955. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references.
6

On development of ultrahard hafnium and titanium carbide materials

Maseko, Emily Tholakele 10 September 2012 (has links)
M.Tech. / A mixture of HfC and TiC powders and a (Hf,Ti)C powder have been hot pressed with 4wt% Ni. In the absence of Ni the hot pressed temperature was 2000 °C and in the presence of Ni 1650 °C. The pressure of 30 MPa was applied in both cases. The starting powders were substoichiometric, as deduced from XRD spectra analyses, and the (Hf,Ti)C powders consisted of a range of compositions, as indicated by the width of the XRD peaks. In the absence of Ni the powders sintered without the formation of a liquid phase. In the case of HfC and TiC mixture, high- energy dry milled HfC + TiC +C black powder sintering occurred with simultaneous formation of (Hf,Ti)C solid solution. On account of mutual solid solubility of two carbides vacancy interdiffusion controlled the solution as well as the sintering process, assisted by the high concentration of vacancies in the starting powders. In the case of (Hf,Ti)C powder diffusion was also the controlling process because t he solid solution was not h omogeneous a nd the system t ended to homogenization, as shown by t he narrowing of t he XRD peaks after sintering. Since the diffusion of HfC into TiC did not occur at the same rate as the diffusion of TiC into HfC (as expected, on account of the different melting points of the two materials) diffusional porosity was observed in some of the (Hf, Ti) C grains. Grain growth was substantial but uniform. In the presence of Ni, sintering occurred with the formation of a liquid phase. The volume fraction of the liquid phase formed was sufficient to yield a low porosity. Grain growth was less than in the case of material sintered without Ni, probably just on account of lower sintering temperature. In the case of high- energy dry milled the reduction in particle size was observed.
7

Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

Gopalan, Sundararaman. January 2002 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
8

Microstructure and electrical performance of sputter-deposited Hafnium oxide (HfO₂) thin films

Aguirre, Brandon A., January 2009 (has links)
Thesis (M.S.)--University of Texas at El Paso, 2009. / Title from title screen. Vita. CD-ROM. Includes bibliographical references. Also available online.
9

Current transport mechanism of hafnium oxide films prepared by direct sputtering /

Ng, Kit Ling. January 2003 (has links)
Thesis (M. Phil.)--Hong Kong University of Science and Technology, 2003. / Includes bibliographical references. Also available in electronic version. Access restricted to campus users.
10

Deposition and characterization of HfO₂ thin films /

Zou, Shubing, January 1994 (has links)
Thesis (M.S.)--Virginia Polytechnic Institute and State University, 1994. / Vita. Abstract. Includes bibliographical references (leaves 68-70). Also available via the Internet.

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