This research reports a simple and novel method to fabricate microlens arrays by soft stamping the unexposed SU-8 photoresist. A SU-8 based stamp composed of micro-nozzle arrays with a reservoir structure on a glass substrate is first fabricated using a process of dosage control exposure. The unexposed SU-8 is then encapsulated in the cross-linked SU-8 shell and was used as the ¡§ink¡¨ for the stamping process. The proposed SU-8 microlens array is then formed by stamping the formed SU-8 structure on a bare glass substrate at a temperature higher than the glass transition temperature (Tg) of the unexposed SU-8 microlens array. Lenses with various radii of curvature can be formed by controlling the working temperature during the stamping process. In addition, this work also employed a simple electric static pulling scheme to manipulate the fabricated lenses profiles. Aspherical SU-8 microlens arrays with a wide range of tunable focal lengths were fabricated with this approach. Furthermore, we develop an advanced localize E-field control technique to fabricate microlenses with various focus length and microlenses with different tilt angle in a single lens array sheet. A novel grayscale mask fabrication technique is also proposed first. This low cost and rapid method is applied on stepwise and continuous tilt plane fabrication for produces a gradually changed E-field. Hetero axes and focus lengths microlenses are fabricated with this approach. In order to farther understand the real E-field distribution, a novel PCF based E-field sensor fabrication technique is also proposed. This technique also shows the potential on various PCF based devices fabrications.