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Research for color purity of blue organic light- emitting diodes with the various thicknesses of organic layerLiao, Kuo-Chien 19 August 2008 (has links)
Organic light-emitting Diode (OLED) emits light itself. It owns many advantages of optical-electronic characteristics as compared with Thin Films Transistor-Liquid Crystal Display (TFT-LCD). In order to achieve the requirement for full color flat panel display, the three primary colors which are red, green, blue (R,G,B) with high luminance¡Bhigh current efficiency¡Band high color purity are important study of research and development for OLED.
In our experiment, the major materials are NPB¡BDPVBi¡BAlq3¡BLiF¡BPBD¡BDCJTB¡FThe materials of NPB¡BDPVBi¡BAlq3,LiF is used as hole transporting layer¡Bblue emission layer¡Belectron transporting layer, and electron injection layer, respectively. PBD is hole-blocking layer and DCJTB is red emission layer which is intended to indirectly demonstrate the hole-blocking effect in the interface between NPB and DPVBi layer.
The blue light emission with short wavelength plays an important role in color conversion method (CCM) of full color technology. In the study, we improve and research on color purity of blue OLED by various thicknesses of organic layer. In addition, we research the influence of the device with different thicknesses of PBD layer as hole-blocking layer. In order to improve the color mixing phenomenon, we add extra DPVBi layer to the device with PBD layer. It can improve the blue color purity and obtain narrower full width at half maximum (FWHM).
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C60:LiF Hole Blocking Layer for Bulk-heterojunction Solar CellsGao, Dong 31 December 2010 (has links)
A standard procedure for P3HT:PCBM bulk-heterojunction solar cells has been developed. Fabrication conditions, such as environment; solution concentration, thickness of active layer or post-treatment methods are systematically optimized. The best device performance is obtained by slow-drying spin-coated P3HT:PCBM (1:0.8) blend layer with DCB as solvent. C60:LiF composite films with up to 80% LiF concentration as hole blocking layer have been developed to significantly increase power conversion efficiencies of OPV devices. The short-circuit current density is greatly enhanced, without sacrificing open-circuit voltage and fill factor. Due to its superior oxygen diffusion blocking effect, the C60:LiF composite layer also can provide a more effective passivation film than a thin LiF layer, resulting in an impressive enhancement in air stability of devices.
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C60:LiF Hole Blocking Layer for Bulk-heterojunction Solar CellsGao, Dong 31 December 2010 (has links)
A standard procedure for P3HT:PCBM bulk-heterojunction solar cells has been developed. Fabrication conditions, such as environment; solution concentration, thickness of active layer or post-treatment methods are systematically optimized. The best device performance is obtained by slow-drying spin-coated P3HT:PCBM (1:0.8) blend layer with DCB as solvent. C60:LiF composite films with up to 80% LiF concentration as hole blocking layer have been developed to significantly increase power conversion efficiencies of OPV devices. The short-circuit current density is greatly enhanced, without sacrificing open-circuit voltage and fill factor. Due to its superior oxygen diffusion blocking effect, the C60:LiF composite layer also can provide a more effective passivation film than a thin LiF layer, resulting in an impressive enhancement in air stability of devices.
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Design and theoretical study of Wurtzite III-N deep ultraviolet edge emitting laser diodesSatter, Md. Mahbub 12 January 2015 (has links)
Designs for deep ultraviolet (DUV) edge emitting laser diodes (LDs) based on the wurtzite III-nitride (III-N) material system are presented. A combination of proprietary and commercial advanced semiconductor LD simulation software is used to study the operation of III-N based DUV LDs theoretically. Critical factors limiting device performance are identified based on an extensive literature survey. A comprehensive design parameter space is investigated thoroughly with the help of advanced scripting capabilities. Several design strategies are proposed to eliminate the critical problems completely or partially.
A DUV LD design is proposed based exclusively on AlInN active layers grown epitaxially on bulk AlN substrates because AlInN offers a promising alternative to AlGaN for the realization of LDs and LEDs operating in the DUV regime. The proposed AlInN-based design also features a tapered electron blocking layer (EBL) instead of a homogeneous one. Tapered EBLs redistribute the interfacial polarization charge volumetrically throughout the entire EBL thickness via compositional grading, and eliminate the parasitic inversion layer charge.
AlGaN based DUV LD designs are explored also because at present, it may be difficult to grow AlInN epitaxially with superior crystalline quality. Polarization charge matching is proposed to improve electron and hole wavefunction overlap within the active region. Although the strategy of polarization charge matching has already been proposed in the literature to enhance performance of visible wavelength LEDs and LDs, the proposed design presents the first demonstration that polarization charge matching is also feasible for DUV LDs operating at sub-300 nm wavelengths.
A lateral current injection (LCI) LD design is proposed featuring polarization-charge-matched barriers and regrown Ohmic contacts to avoid a group of issues related to the highly inefficient p-type doping of wide bandgap III-N materials in vertical injection designs. The proposed design partially decouples the problem of electrical injection from that of optical confinement. Although the idea of an LCI LD design has been proposed in the literature in the 90s to be used as longer wavelength active sources in optoelectronic integrated circuits using GaInAsP/InP and related material systems, the proposed design is the first theoretical demonstration that this concept can be applied to DUV LDs based on III-N material system.
To solve the problem of hole transport in vertical injection designs, a DUV LD design based exclusively on AlGaN material system is presented, featuring an inverse-tapered p-waveguide layer instead of an EBL. Several EBL designs are investigated, and compared with conventionally-tapered EBL design. Through judicious volumetric redistribution of fixed negative polarization charge, inverse tapering may be exploited to achieve nearly flat valence band profiles free from barriers to hole injection into the active region, in contrast to conventional designs. Numerical simulations demonstrate that the inverse tapered strategy is a viable solution for efficient hole injection in vertical injection DUV LDs operating at shorter wavelengths (< 290 nm).
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