The morphology evolution of high-temperature grown AlN nucleation layers on (111) silicon has been studied using atomic force microscopy (AFM). The structure and morphology of subsequently grown GaN film were characterized by optical microscopy, scanning electron microscopy, x-ray diffraction, and photoluminescence measurement. It was found that a thicker AlN buffer layer resulted in a higher crystalline quality of subsequently grown GaN films. The GaN with a thicker buffer layer has a narrower PL peak. Cracks were found in the GaN film which might be due to the formation of amorphous SiNx at the AlN and Si interface. / Singapore-MIT Alliance (SMA)

AlN nucleation layers are being investigated for growth of GaN on Si. The microstructures of high-temperature AlN nucleation layers grown by MOCVD on Si (111) substrates with trimethylaluminium pre-treatments have been studied using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The AFM results show that with TMA pre-treatments, AlN grows in a pseudo-2-dimensional mode because the lateral growth rate of AlN is increased, and the wetting property of the AlN on silicon is improved. Also, no amorphous SiNx layer was observed at the interface with TMA pre-treatments and AlN films with good epitaxial crystalline quality were obtained. Transmission electron diffraction patterns revealed that the AlN and Si have the crystallographic orientation relationship AlN [0001]║Si[111] and AlN[11 2 0] ║Si[110]. High resolution transmission electron microscopy indicates a 5:4 lattice matching relationship for AlN and Si along the Si [110] direction. Based on this observation, a lattice matching model is proposed. / Singapore-MIT Alliance (SMA)

The periodic silane burst technique was employed during metalorganic chemical vapor deposition of epitaxial GaN on AlN buffer layers grown on Si (111). Periodic silicon delta doping during growth of both the AlN and GaN layers led to growth of GaN films with decreased tensile stresses and decreased threading dislocation densities, as well as films with improved quality as indicated by x-ray diffraction, micro-Raman spectroscopy, atomic force microscopy, and transmission electron microscopy. The possible mechanism of the reduction of tensile stress and the dislocation density is discussed in the paper. / Singapore-MIT Alliance (SMA)

Semiconductor nanowires are nanostructures with lengths up to few microns and small cross sections (10ths of nanometers). In the recent years the development in the field of III-N nanowire technology has been spectacular. In particular they are consider as promising building in nanoscale electronics and optoelectronics devices; such as photodetectors, transistors, biosensors, light source, solar cells, etc. In this work, we present fabrication and the characterization of photodetector and light emitter based devices on III-N nanowires. First we present a study of a visible blind photodetector based on p-i-n GaN nanowires ensembles grown on Si (111). We show that these devices exhibit a high responsivity exceeding that of thin film counterparts. We also demonstrate UV photodetectors based on single nanowires containing GaN/AlN multi-axial quantum discs in the intrinsic region of the nanowires. Photoluminescence and cathodoluminescence spectroscopy show spectral contributions above and below the GaN bandgap according to the variation of the discs thickness. The photocurrent spectra show a sub-band-gap peak related to the interband absorption between the confined states in the large Qdiscs. Finally we present a study of photodetectors and light emitters based on radial InGaN/GaN MQW embedded in GaN wires. The wires used as photodetectors showed a contribution below the GaN bandgap. OBIC measurements demonstrate that, this signal is exclusively generated in the InGaN MQW region. We showed that LEDs based on this structure show a electroluminescence emission and a red shift when the In content present in the QWs increases which is in good agreement with photoluminescence and cathodoluminescence results.

Les nanofils semiconducteurs sont des nano-objets dont la longueur peut aller jusqu'à quelques microns et dont la section peut être inférieure à la dizaine de nanomètre. En particulier, les nanofils de nitrures d'éléments III (GaN, AlN, InN, leurs alliages ternaires et leurs hétérostructures) sont extrêmement prometteurs en vue du développement d’une nouvelle génération de dispositifs d’électronique et d’optoélectronique tels que photodétecteurs, nanotransistors, biocapteurs, source de lumière, cellules solaires, etc.Dans ce travail, nous présentons la fabrication et la caractérisation de deux types de dispositifs à base de nanofils de nitrures III-V : des photodétecteurs d’une part et des dispositifs émetteurs de lumière d’autre part. Tout d'abord, nous avons réalisé et caractérisé un photodétecteur UV aveugle à la lumière du jour à base de nanofils de GaN verticalement alignés sur un substrat de Si(111) contenant une jonction p-n. Nous avons montré que ces dispositifs présentent une réponse supérieure à celle de leurs homologues en couches minces. Ensuite, nous avons fait la démonstration de photodétecteurs UV à base de nanofils uniques contenant des disques quantiques GaN / AlN multi-axiales insérés dans une région non intentionnellement dopé. Les résultats obtenus par spectroscopie de photoluminescence (PL) et cathodoluminescence (CL) montrent des contributions spectrales en-dessous et au-dessus de la bande interdite du GaN attribuées a la variation de l'épaisseur des disques. Les spectres de photocourant montrent un pic sous la bande interdite lié à l'absorption inter-bande entre les états confinés dans les disques les plus larges. Enfin, nous présentons une étude de photodétecteurs et émetteurs de lumière à base de nanofils de GaN contentant une hétérostructure cœur-coquille InGaN / GaN. Les fils utilisés comme photodétecteurs ont montré une contribution en dessous de la bande interdite de GaN. D’autre part, les mesures OBIC démontrent que ce signal provient exclusivement de la région active. Les fils de type LED basés sur la même structure montrent une forte émission d'électroluminescence et un décalage vers le rouge lorsque le taux d’indium présent dans les disques quantiques augmente, en accord avec les résultats de photoluminescence et de cathodoluminescence. / Semiconductor nanowires are nanostructures with lengths up to few microns and small cross sections (10ths of nanometers). In the recent years the development in the field of III-N nanowire technology has been spectacular. In particular they are consider as promising building in nanoscale electronics and optoelectronics devices; such as photodetectors, transistors, biosensors, light source, solar cells, etc. In this work, we present fabrication and the characterization of photodetector and light emitter based devices on III-N nanowires. First we present a study of a visible blind photodetector based on p-i-n GaN nanowires ensembles grown on Si (111). We show that these devices exhibit a high responsivity exceeding that of thin film counterparts. We also demonstrate UV photodetectors based on single nanowires containing GaN/AlN multi-axial quantum discs in the intrinsic region of the nanowires. Photoluminescence and cathodoluminescence spectroscopy show spectral contributions above and below the GaN bandgap according to the variation of the discs thickness. The photocurrent spectra show a sub-band-gap peak related to the interband absorption between the confined states in the large Qdiscs. Finally we present a study of photodetectors and light emitters based on radial InGaN/GaN MQW embedded in GaN wires. The wires used as photodetectors showed a contribution below the GaN bandgap. OBIC measurements demonstrate that, this signal is exclusively generated in the InGaN MQW region. We showed that LEDs based on this structure show a electroluminescence emission and a red shift when the In content present in the QWs increases which is in good agreement with photoluminescence and cathodoluminescence results.