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Materials Engineering and Control for Advancing High-Efficiency CdSe/CdTe Solar CellsJamarkattel, Manoj K. 15 June 2023 (has links)
No description available.
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Amorphous oxide semiconductors in circuit applicationsMcFarlane, Brian Ross 24 September 2008 (has links)
The focus of this thesis is the investigation of thin-film transistors (TFTs) based on amorphous oxide semiconductors (AOSs) in two circuit applications. To date, circuits implemented with
AOS-based TFTs have been primarily enhancement-enhancement inverters, ring oscillators based
on these inverters operating at peak frequencies up to ~400 kHz, and two-transistor one-capacitor
pixel driving circuits for use with organic light-emitting diodes (OLEDS). The first application
investigated herein is AC/DC rectification using two circuit configurations based on staggered
bottom-gate TFTs employing indium gallium oxide (IGO) as the active channel layer; a traditional
full bridge rectifier with diode-tied transistors and a cross-tied full-wave rectifier are demonstrated,
which is analogous to what has been reported previously using p-type organic TFTs. Both circuit
configurations are found to operate successfully up to at least 20 MHz; this is believed to be the
highest reported operating frequency to date for circuits based on amorphous oxide semiconductors.
Output voltages at one megahertz are 9 V and ~10.5 V, respectively, when driven with a differential 7.07 Vrms sine wave. This performance is superior to that of previously reported organic-based
rectifiers.
The second AOS-based TFT circuit application investigated is an enhancement-depletion
(E-D) inverter based on heterogeneous channel materials. Simulation results using models based on
a depletion-mode indium zinc oxide (IZO) TFT and an enhancement-mode IGO TFT result in a
gain of ~15. Gains of other oxide-based inverters have been limited to less than 2; the large gain of
the E-D inverter makes it well suited for digital logic applications. Deposition parameters for the
IGO and IZO active layers are optimized to match the models used in simulation by fabricating
TFTs on thermally oxidized silicon and patterned via shadow masks. Integrated IGO-based TFTs
exhibit a similar turn-on voltage and decreased mobility compared to the shadow masked TFTs.
However, the integrated IZO-based TFTs fabricated to date are found to be conductive and exhibit
no gate modulation. Due to the conductive nature of the load, the fabricated E-D inverter shows
no significant output voltage variation. This discrepancy in performance between the integrated
and shadow-masked IZO devices is attributed to processing complications. / Graduation date: 2009
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Growth and Characterization of Wide Band-Gap Group III Oxide Semiconductors by MOCVDHernandez, Armando, Jr. January 2021 (has links)
No description available.
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