Spelling suggestions: "subject:"oon implantation. semiconductors"" "subject:"oon implantation. ⅴsemiconductors""
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Simulation of defect nucleation with low energy amorphizing silicon and germanium implantsBellarmine, P. Xavier. January 2004 (has links)
Thesis (M.S.)--University of Florida, 2004. / Title from title page of source document. Document formatted into pages; contains 132 pages. Includes vita. Includes bibliographical references.
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A study of effect of precipitates and lattice defects on the electrical performance of P-N junctions /Ryoo, Kunkul, January 1986 (has links)
Thesis (Ph. D.)--Oregon Graduate Center, 1986.
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Defect studies of ion implanted silicon and silicon dioxide for semiconductor devicesLay, Matthew Da-Hao Unknown Date (has links) (PDF)
We have studied the introduction of defects in silicon wafers with low dose channelling ion implantation. (For complete abstract open document)
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Ion implant tool throughput optimization for semiconductor manufacturingLo, Raymond W. 01 January 2003 (has links)
No description available.
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