Nanocrystalline silicon (nc-Si:H) is an attractive material for fabrication of low temperature, large area electronic devices due to superior properties versus the traditional amorphous silicon (a-Si:H) and polycrystalline silicon (polySi). Nanocrystalline silicon possess higher carrier mobility and better stability than a-Si:H and better device uniformity and lower fabrication cost than polySi. This thesis looks at the application of nc-Si:H material in fabricating two different diodes used for rectification and light generation. Optimization of n-type nc-Si:H deposited via plasma enhanced vapor chemical deposition (PECVD) was achieved through adjusting the concentration ratio of phosphine (PH3) dopant source gas versus silane (SiH4). Optimizing for dark conductivity, n+ nc-Si:H material with dark conductivity of 25.3 S/cm was deposited using a [PH3]/[SiH4] ratio of 2%. Using the optimized n+ nc-Si:H film, a p-n junction diode utilizing an undoped and an n+ nc-Si:H layers was fabricated designed for rectification use. The diode achieved a current density of 1 A/cm2, an ON/OFF current ratio of 106 and a non-ideality factor of 1.9. When the 200*200µm2 nc-Si:H diodes were employed in a full-wave bridge rectifier, a 2.6 V direct current voltage could be generated from an input sine wave signal with amplitude 2 VRMS and frequency of 13.56 MHz, thus demonstrating the feasibility of using nc-Si:H to fabricate diodes for using on radio frequency identification (RFID) tags. Nanocrystalline silicon was also applied in fabrication of a light emitting diode (LED), by utilizing the nanocrystals embedded inside nc-Si:H, inside which recombination of carriers could result in radiative recombination. By limiting the deposition time of the nc-Si:H, 10 – 20 nm thick films of nc-Si:H were used to fabrication a p-i-n structure LED with average crystallite size between 7.5 nm to 13.7 nm corresponding to an theoretical emission wavelengths in the near infrared region of 875 nm to 963 nm. Unfortunately, light emission from the nc-Si:H LED were not detected using two different methods. Undetectable emission could have been due to a combination of low recombination efficiency due to carriers recombining in defects in the a-Si:H matrix and majority of current travelling completely through the nc-Si:H films without recombining. A study of the thin intrinsic nc-Si:H films used in the LED was carried out. The thin films were found to be highly defected, with large variation in current-voltage relationship measured and hysteresis observed in the IV characteristic. Annealing the nc-Si:H films were found to cause a drop in conductivity explained through hydrogen effusion from the nc-Si:H film during annealing. Passivation of defects was achieved through the use of hydrogen plasma which resulted in a lowering of activation energy measured in the film. Oxygen plasma was also trialed for passivating the nc-Si:H film but the effect was only a temporary increase in current conduction attributed to oxygen ions chemisorbing temporarily at the film surface.

Nanocrystalline silicon (nc-Si:H) is an attractive material for fabrication of low temperature, large area electronic devices due to superior properties versus the traditional amorphous silicon (a-Si:H) and polycrystalline silicon (polySi). Nanocrystalline silicon possess higher carrier mobility and better stability than a-Si:H and better device uniformity and lower fabrication cost than polySi. This thesis looks at the application of nc-Si:H material in fabricating two different diodes used for rectification and light generation. Optimization of n-type nc-Si:H deposited via plasma enhanced vapor chemical deposition (PECVD) was achieved through adjusting the concentration ratio of phosphine (PH3) dopant source gas versus silane (SiH4). Optimizing for dark conductivity, n+ nc-Si:H material with dark conductivity of 25.3 S/cm was deposited using a [PH3]/[SiH4] ratio of 2%. Using the optimized n+ nc-Si:H film, a p-n junction diode utilizing an undoped and an n+ nc-Si:H layers was fabricated designed for rectification use. The diode achieved a current density of 1 A/cm2, an ON/OFF current ratio of 106 and a non-ideality factor of 1.9. When the 200*200µm2 nc-Si:H diodes were employed in a full-wave bridge rectifier, a 2.6 V direct current voltage could be generated from an input sine wave signal with amplitude 2 VRMS and frequency of 13.56 MHz, thus demonstrating the feasibility of using nc-Si:H to fabricate diodes for using on radio frequency identification (RFID) tags. Nanocrystalline silicon was also applied in fabrication of a light emitting diode (LED), by utilizing the nanocrystals embedded inside nc-Si:H, inside which recombination of carriers could result in radiative recombination. By limiting the deposition time of the nc-Si:H, 10 – 20 nm thick films of nc-Si:H were used to fabrication a p-i-n structure LED with average crystallite size between 7.5 nm to 13.7 nm corresponding to an theoretical emission wavelengths in the near infrared region of 875 nm to 963 nm. Unfortunately, light emission from the nc-Si:H LED were not detected using two different methods. Undetectable emission could have been due to a combination of low recombination efficiency due to carriers recombining in defects in the a-Si:H matrix and majority of current travelling completely through the nc-Si:H films without recombining. A study of the thin intrinsic nc-Si:H films used in the LED was carried out. The thin films were found to be highly defected, with large variation in current-voltage relationship measured and hysteresis observed in the IV characteristic. Annealing the nc-Si:H films were found to cause a drop in conductivity explained through hydrogen effusion from the nc-Si:H film during annealing. Passivation of defects was achieved through the use of hydrogen plasma which resulted in a lowering of activation energy measured in the film. Oxygen plasma was also trialed for passivating the nc-Si:H film but the effect was only a temporary increase in current conduction attributed to oxygen ions chemisorbing temporarily at the film surface.

Electrical transport in materials is typically diffusive, due to dominant momentum-relaxing scattering of carriers with the phonons or defects. In ultraclean material systems such as GaAs/AlGaAs or graphene/hBN heterostructures, momentum-relaxing can be suppressed, leading to the onset of non-diffusive transport regimes, where Ohm's law is no longer valid. Within these non-diffusive regimes, the hydrodynamic regime occurs when momentum-conserving electron-electron scattering length scale is smaller than the device length scale (usually at intermediate temperatures). On the other hand, weak electron-electron scattering (at low temperatures) results in ballistic transport, commonly understood using the familiar single-particle framework of injected carriers travelling in straight line trajectories with intermittent reflections off device boundaries. Both the ballistic and hydrodynamic regimes can exhibit a emph{negative} nonlocal resistance, and collective behaviour such as the formation of current vortices. In this work, we study nonlocal current-voltage characteristics in mesoscopic devices fabricated from a GaAs/AlGaAs heterostructure that hosts a two-dimensional electron system in a GaAs quantum well. First, we report a quadratic non-linearity in the nonlocal current-voltage characteristics that manifests in any device where a nonlocal voltage measurement is possible. Using measurements at low temperatures ($sim$ 4 K) across multiple devices and considering various contact configurations for each device, we show that the non-linearity is universal. We apply the non-linearity to rectification and frequency multiplication. We also report on a periodic peaks in the nonlocal voltage vs. magnetic field, in an enclosed mesoscopic geometry in which transverse magnetic focusing (TMF) is typically studied. These peaks occur at weak magnetic fields, are independent of the source-detector separation and are distinct from TMF. Our experimental findings are backed by an extensive set of simulations using in both the semiclassical as well as quantum-coherent transport models. / Master of Science / Current is made up of charged particles such as electrons moving through a material. Typically, current is proportional to the applied voltage and flows from higher to lower potential within the device with the potential decreasing monotonically as we move from the source contact to the drain contact irrespective of the path taken through the device. This is commonly known as Ohm's law, and is followed in most materials we come across. The motion of electrons carrying this current is akin to the motion of balls inside a pinball machine, their momentum randomized by intermittent collisions due to lattice vibrations, defects and impurities present in the material. In ultraclean two-dimensional materials at low-intermediate temperatures (where lattice vibration is weak), these collisions become sparse. Collisions of electrons with other electrons now become important. When electron-electron collisions are frequent, the electrons collectively behave like a fluid, giving rise to so called hydrodynamic transport. On the other hand, when electron-electron collisions are sparse as well, electrons move unhindered in ballistic straight line trajectories until they reflect off the device boundaries. This is known as ballistic transport. Under both these transport regimes, Ohm's law breaks down, leading to interesting physical phenomena such as the formation of current whirlpools. In this work, we study the voltage measured at a point in the device which is distinct from the point where current is injected or extracted. This is commonly known as the nonlocal voltage. We explore the relationship between the nonlocal voltage and the injected current and find it to be significantly different from predictions made by Ohm's law. We use this novel current-voltage relationship to build a rectifier and frequency multiplier - two devices commonly used in high-frequency detection, radar systems and telecommunications. We also report previously unseen periodic oscillations in the nonlocal voltage when the magnetic field perpendicular to the device is varied. Using high-resolution simulations, we show the these oscillations can not be explained by looking at individual electron paths, and arise due to contribution from all electrons that travel through the device.