Global ETD Search

1	Dynamic holographic masks for adaptive optical lithography Bay, Christoph January 2012 (has links) No description available. 620
2	Bimetallic thermal resists for photomask, micromachining and microfabrication / Tu, Richard Yuqiang. January 1900 (has links) Thesis (Ph.D.) - Simon Fraser University, 2004. / Theses (School of Engineering Science) / Simon Fraser University.
3	Generalized inverse lithography methods for phase-shifting mask design Ma, Xu. January 2007 (has links) Thesis (M.E.E.)--University of Delaware, 2007. / Principal faculty advisor: Gonzalo Arce, Dept. of Electrical and Computer Engineering. Includes bibliographical references.
4	Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition Rathsack, Benjamen Michael. January 2001 (has links) Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references. Available also from UMI Company.
5	The use of edge gradient analysis on chrome and emulsion photomasks to determine modulation transfer functions / Levin, Marcy E. January 1985 (has links) Thesis (B.S.)--Rochester Institute of Technology, 1985. / Typescript. Includes bibliographical references (leaves 35-36).
6	Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand / Wright, A. J. January 1900 (has links) Thesis (M.E.)--University of Canterbury, 2007. / Typescript (photocopy). "March 2007." Includes bibliographical references (p. 123-127). Also available via the World Wide Web.
7	Design and synthesis of molecular resists for high resolution patterning performance Cheshmehkani, Ameneh 13 January 2014 (has links) In this thesis, different approaches in synthesizing molecular resist are examined, and structure-property relations for the molecular resist properties are studied. This allows for design of resists that could be studied further as either negative or positive tone resists in photolithography. A series of compounds having different number of acrylate moiety, and different backbones were investigated for photoresist application. Thermal curing of acrylate compounds in organic solvent was also examined. Film shrinkage, as well as auto-polymerization was observed for these compounds that make them unsuitable as photoresist material. Furthermore, calix[4]resorcinarenes (C4MR) was chosen as backbone, and the functional groups was selected as oxetane and epoxy. Full functionalized C4MR compounds with oxetane, epoxy and allyl were synthesized. Variable-temperature NMR of C4MR-8Allyl was studied in order to get a better understanding of the structure’s conformers. Energy barrier of exchange (ΔG#) was determined from coalescence temperatures, and was 57.4 KJ/mol for aromatic and vinyl hydrogens and 62.1 KJ/mol for allylic hydrogens. Photoresist Lithography Calixarene Oxetane Epoxide Acrylate Photoresists Masks (Electronics) Photolithography
8	Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition Rathsack, Benjamen Michael 04 April 2011 (has links) Not available / text Masks (Electronics) Image processing--Digital techniques Lithography Integrated circuits--Masks
9	Development and characterization of advanced electron beam resists Agrawal, Ankur 05 1900 (has links) No description available. Lithography, Electron beam Masks (Electronics) Semiconductors Design and construction
10	Photoresist development on SiC and its use as an etch mask for SiC plasma etch Mishra, Ritwik. January 2002 (has links) Thesis (M.S.) -- Mississippi State University. Department of Electrical and Computer Engineering. / Title from title screen. Includes bibliographical references.

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