Die attachment is one of the most important processes in the packaging of power semiconductor devices. The current die-attach materials/techniques, including conductive adhesives and reflowed solders, can not meet the advance of power conversation application. Silver paste sintering has been widely used in microelectronics and been demonstrated the superior properties. The high processing temperature, however, prevents its application of interconnecting power semiconductor devices. This research focuses processing and characterization of micron-scale and nanoscale silver paste for power semiconductor devices attachment. Lowering the processing temperature is the essential to implement sintering silver paste for power semiconductor devices attachment. Two low-temperature sintering techniques - pressure-assisted sintering micro-scale silver paste and sintering nanoscale silver paste without external pressure - were developed. With the large external pressure, the sintering temperature of micro-scale silver paste can be significantly lowered. The experimental results show that by using external pressure (>40MPa), the commercial micro-scale silver paste can be sintered to have eighty percent relative density at 240oC, which is compatible with the temperature of solder reflowing. The measured properties including electrical conductivity, thermal conductivity, interfacial thermal resistance, and the shear strength of sintered silver joints, are significantly better than those of the reflowed solder layer. Given only twenty percent of small pores in the submicron range, the reliability of the silver joints is also better than that of the solder joints under the thermal cycled environment. The large external pressure, however, makes this technique difficult to automatically implement and also has a potential to damage the brittle power semiconductor devices. Reducing silver particles in the paste from micro-size to nanoscale can increases the sintering driving force and thus lowers the sintering temperature. Several approaches were developed to address sintering challenges of nanoscale silver particles, such as particles aggregation and/or agglomeration, and non-densification diffusion at low temperature. These approaches are : nanoscale silver slurry, instead of dry silver powder, is used to keep silver particles stable and prevent their aggregation. Ultrasonic vibration, instead of conventional ball milling, is applied to disperse nanoscale silver particles in the paste from to avoid from agglomerating. Selected organics in the paste are applied to delay the onset of mass-diffusion and prevent non-densification diffusion at low temperature. The measured results show that with heat-treatment at 300oC within one hour, the sintered nanoscale silver has significantly improved electrical and thermal properties than reflowed solders. The shear strength of sintered silver interconnection is compatible with that of solder. The low-temperature sinterable nanoscale silver paste was applied to attach the bare Silicon carbide (SiC) schottky barrier diode (SBD) for high temperature application. Limited burn-out path for organics in the silver layer challenges the sintering die-attach. This difficulty was lessened by reducing organics ratio in the silver paste. The effects of die-size and heating rate on sintering die-attach were also investigated. The single chip packaging of SiC SBD was fabricated by sintering die-attach and wire-bonding. The tested results demonstrate that the sintering nanoscale silver paste can be applied as a viable die-attach solution for high-temperature application. / Ph. D.

This research has developed a lead-free semiconductor device interconnect technology by studying the processing-microstructure-property relationships of low-temperature sintering of nanoscale silver pastes. The nanoscale silver pastes have been formulated by adding organic components (dispersant, binder and thinner) into nano-silver particles. The selected organic components have the nano-particle polymeric stabilization, paste processing quality adjustment, and non-densifying diffusion retarding functions and thus help the pastes sinter to ~80% bulk density at temperatures no more than 300°C. It has been found that the low-temperature sintered silver has better electrical, thermal and overall thermomechanical properties compared with the existing semiconductor device interconnecting materials such as solder alloys and conductive epoxies. After solving the organic burnout problems associated with the covered sintering, a lead-free semiconductor device interconnect technology has been designed to be compatible with the existing surface-mounting techniques with potentially low-cost. It has been found that the low-temperature sintered silver joints have high electrical, thermal, and mechanical performance. The reliability of the silver joints has also been studied by the 50-250°C thermal cycling experiment. Finally, the bonging strength drop of the silver joints has been suggested to be ductile fracture in the silver joints as micro-voids nucleated at microscale grain boundaries during the temperature cycling. The low-temperature silver sintering technology has enabled some benchmark packaging concepts and substantial advantages in future applications. / Ph. D.

This study focused on the development and evaluation of die-attach material and substrate technology for high-temperature applications. For the die-attach material, a low-temperature sintering technique enabled by a nanoscale silver paste was developed for attaching large-area (>100 mm2) semiconductor chips. The nanoscale silver paste can be sintered at a much lower temperature (<300 oC) than in the conventional sintering process (>800 oC), and at the same time reached about 80 vol% bulk density. Analyses of the sintered joints by scanning acoustic imaging and electron microscopy showed that the attachment layer had a uniform microstructure with micron-sized porosity with the potential for high reliability under high temperature applications. We also investigated the effects of a large temperature cycling range on the reliability of direct bonded aluminum (DBA) substrate. DBA substrates with different metallization were thermally cycled between -55 oC and 250 oC. Unlike with the DBC substrate, no delamination of aluminum from the aluminum nitride ceramic base-plate was observed for the DBA substrates. However, aluminum surface became roughened during the thermal cycling test. It was believed that in the high-temperature regime, the significant amount of thermomechanical stress and grain-scale deformation would cause recrystallization and grain-boundary sliding in the aluminum layer, which would further lead to the observed increase in surface roughness. The influence of metallization over the aluminum surface on the extent of surface roughness was also characterized. In addition to evaluating the reliability of nanoscale silver paste and DBA substrate individually, this work also conducted experiments that characterize the compatibility of nanoscale silver paste on DBA substrate in terms of reliability in a high-temperature environment. In the large-area attachment, the sintered silver was found to be very compliant with the deformed aluminum. The device-to-silver and silver-to-substrate interfaces remain intact after up to 800 cycles. No large scale delamination and horizontal cracks were observed. However, some vertical crack lines began to show after certain number of cycles. It was believed that these vertical cracks were caused by the thermomechanical stresses in the sintered silver layer. In addition, with regard to the thermal performance, since most of the heat was generated from the semiconductor devices and were transferred vertically through the die-attach material to substrate, these vertical cracks were also considered more advantageous than horizontal cracks. / Ph. D.