Theoretical part of diploma thesis was focused on the search of the state of knowledge in the area of plasma, plasma polymerization and characterization of thin films. Plasma-enhanced chemical vapor deposition (PECVD) was described in the experimental part together with selected analytical techniques. The technology with high level of reproducibility was reached by precise control of deposition conditions, monitoring of plasma, and analysis of plasma products using mass spectrometry. The obtained results demonstrated that the elemental composition, chemical structure, optical and mechanical properties of films were influenced by effective power used.

Orientador: Mario Antonio Bica de Moraes / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-09T10:56:06Z (GMT). No. of bitstreams: 1 Gelamo_RogerioValentim_D.pdf: 1517991 bytes, checksum: fd93a7ffa508ced1257f9474d2674aed (MD5) Previous issue date: 2007 / Resumo: Filmes finos de polisiloxanos, polisilazanos e policarbosilanos, sintetizados por Deposição Química de Vapor Assistida por Plasma (PECVD), foram irradiados com os íons He +, Ne +, Ar +e Kr +, com energia de 170 keV, e fluências de 1x10 14 , 5x10 14 , 1x10 15 , 5x10 15e 1x10 16 íons/cm 2 . A irradiação iônica promoveu modificações significativas na composição elementar, na estrutura química, e consequentemente nas propriedades físicas dos filmes. Com o uso de espectroscopias de retro-espalhamento Rutherford (RBS) e de recuo frontal (FRS), observou-se que as razões atômicas C/Si, O/Si, N/Si e H/Si sofreram modificações. Em especial, a razão H/Si foi drasticamente diminuída, devido à perda de hidrogênio causada pela irradiação. Oxigênio foi quimicamente incorporado aos filmes, devido à recombinação das ligações pendentes, formadas durante a irradiação, com o ar ambiente. Com relação à estrutura química dos filmes, extinção e formação de novos grupos e de ligações químicas foram observadas com o uso de espectroscopias infravermelha no modo reflexão-absorção (IRRAS) e de fotoelétrons excitados por raios-X (XPS). A densidade volumétrica dos filmes aumentou significativamente com a irradiação. As constantes ópticas, medidas através de espectroscopia ultravioleta-visível e elipsometria, foram também afetadas. Com o aumento da fluência dos íons, o coeficiente de absorção e o índice de refração aumentaram e o gap óptico diminuiu. Medidas de nanoindentação mostraram notáveis aumentos nas durezas dos filmes. Nas mais altas fluências utilizadas, a dureza chegou a valores comparáveis e até maiores que a dos aços ferramenta. Os filmes são convertidos de polímero para a fase cerâmica e a intensidade da conversão é dependente da fluência dos íons. Observou-se ainda que, de modo geral, as modificações são fortemente dependentes das massas dos íons, já que as modificações mais significativas são obtidas com o uso de He+ e Ne+ . A explicação referente a esse efeito é dada em função das transferências de energia eletrônica e nuclear / Abstract: Thin films of polysiloxanes, polysilazanes and polycarbosilanes, synthesized by Plasma Enhanced Chemical Vapor Deposition (PECVD), were irradiated with 170 keV He + , Ne + , Ar + and Kr + ions, at 170 keV at fluences of 1x10 14 , 5 x10 14 , 1x10 15 , 5x10 15 and 1 x10 16 ions/cm -2 . The irradiation promoted significant modifications in the atomic composition, chemical structure, and consequently in the physical properties of the films. Changes in the atomic composition were examined using Rutherford back-scattering spectroscopy (RBS) and forward recoil spectroscopy (FRS). The former was used to determine the C/Si, N/Si and O/Si atomic ratios, while the H/Si ratio was measured by the latter. As a general behavior, these ratios changed with ion irradiation and the decrease in the H/Si ratio was particularly high, as hydrogen was drastically removed by ion bombardment. Oxygen was chemically incorporated into the films due to the reactions involving dangling bonds formed during irradiation, and ambient air. Regarding the chemical structure of the films, extinction and formation of new bonding groups and chemical bonds were observed as a function of the ion fluence using infrared reflection-absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). The volume density of the films increased significantly with irradiaton. The optical constants, determined using ultraviolet-visible spectroscopy and ellipsometry, were also affected by ion irradiation. With increasing ion fluence, the absorption coefficient and refractive index increased, and the optical gap decreased. From nanoindentation measurements. remarkable increases in surface hardness were determined. For the higher fluences, the surface hardness of the films is in the range, or even higher, of that of martensitic tool steels. Thus, ion irradiation changed the relatively soft polymer film into a high density, hard, ceramic material. It was observed that the most significant modifications occur for He+ and Ne+ ions. An explanation to this finding is offered in terms of the electronic and nuclear energy transfer functions / Doutorado / Física da Matéria Condensada / Doutor em Ciências

Every year, many archeological findings are discovered. It is necessary to document and conserve these items dug up from the ground. However, archeologists and conservators cannot handle such a big amount of newly found items. This work offers an alternative approach to standard conservation techniques, increasing the processing capacity and lowering the cost on items’ conservation. Studied alternative, mainly for protection of metallic artefacts, includes thin films based on parylene and organosilicons. Thin films were prepared on two experimental apparatuses. Parylene films were deposited by chemical vapour deposition (CVD). Final product was a thin film of parylene C. Organosilicon thin films were deposited via plasma enhanced chemical vapour deposition (PECVD). PECVD apparatus operates with capacitively coupled radiofrequently initiated plasma. Using hexamethyldisiloxane, thin films very similar to silicon dioxide were produced, thus called SiOx. Thin films were characterized by several methods and compared to standard treatment used by conservators – tannate layer, acrylic furnish Paraloid B72 and microcrystalline wax Revax 30. Parylene films showed excellent conformity and resistance to corrosion on iron substrate. First signs of corrosion were observed on layer of 5 µm thickness after 24 hours in salt fog. On samples coated by SiOx films, corrosion was spreading wide even during 1st hour of the corrosion test. Most probable cause was that SiOx film has thermal expansion coefficient different from iron substrate and due to this fact cracking occurs during cooling down of the treated substrate. On samples coated by standard treatment, corrosion occurred after 1-3 hours of the test. Oxygen transmission rate (OTR) measurements (performed on polypropylene substrate) confirmed good barrier properties of parylene C. Best parylene thin films had OTR approximately 170 cm3•m-2•atm-1•day-1. SiOx films reached good results with OTR 300 cm3•m-2•atm-1•day-1, compared to clean polypropylene substrate with OTR 1700 cm3•m-2•atm-1•day-1. Standard conservation layers could not be applied on polypropylene substrate, thus their OTR was not measured. We did not succeed in finding a substrate which is compatible for all types of treatments. Next, the study focused on combinations of thin films forming sandwich structures. All types let the corrosion attack the substrate during the 1st hour of the test. The cause was insufficient film thickness as well as crack ing of SiOx films due to different thermal expansion properties from the iron substrate. Although SiOx thin films were not deposited on substrate directly, they have excellent adhesion to parylenu and thus they could tear parylenu films due to thermal expansion. However, OTR measurements showed improvement in barrier properties. Multilayer parylene C–SiOx–parylene C–SiOx had OTR 5 cm3•m-2•atm-1•day-1. Final result is that parylene C thin films have better barrier properties than standard coatings and are suitable for conservation of metallic archaeological artefacts. SiOx films and multilayers showed poor anticorrosion protection of metallic substrates but they have good barrier and chemical properties in combination with other types of substrates. Mainly deposited on polymers, there is great potential for their application in many fields. Further research would be focused on new substrates for SiOx thin films and on the improvement of UV stability of parylene films.