Thesis (M.S.) -- Worcester Polytechnic Institute. / Keywords: CROW; PBG; PhC; coupled resonator optical waveguide; metamaterials; photonic crystal; Bloch wave; photonic band gap;dynamic waveguide; Brillouin zone; thermal spreading. Includes bibliographical references (p. 84-87).

The growing speed and bandwidth requirements of telecommunication systems demand all-optical on-chip solutions. Microphotonic devices can deliver low power nonlinear signal processing solutions. This thesis looks at the slow light photonic crystals in chalcogenide glasses to enhance low power nonlinear operation. I demonstrate the development of new fabrication techniques for this delicate class of materials. Both, reactive ion etching and chemically assisted ion beam etching are investigated for high quality photonic crystal fabrication. A new resist-removal technique was developed for the chemical, mechanical and light sensitive thin films. I have developed a membraning method based on vapor phase etching in combination with the development of a save and economical etching tool that can be used for a variety of vapour phase processes. Dispersion engineered slow light photonic crystals in Ge₃₃As₁₂Se₅₅ are designed and fabricated. The demonstration of low losses down to 21±8dB/cm is a prerequisite for the successful demonstration of dispersion engineered slow light waveguides up to a group index of around n[subscript(g)] ≈ 40. The slow light waveguides are used to demonstrate highly efficient third harmonic generation and the first advantages of a pure chalcogenide system over the commonly used silicon. Ge₁₁.₅As₂₄24Se₆₄.₅ is used for the fabrication of photonic crystal cavities. Quality factors of up to 13000 are demonstrated. The low nonlinear losses have enabled the demonstration of second and third harmonic generation in those cavities with powers up to twice as high as possible in silicon. A computationally efficient model for designing coupled resonator bandpass filters is used to design bandpass filters. Single ring resonators are fabricated using a novel method to define the circular shape of the rings to improve the fabrication quality. The spectral responses of the ring resonators are used to determine the coupling coefficient needed for the design and fabrication of the bandpass filters. A flat top bandpass filter is fabricated and characterized as demonstration of this method. A passive all-optical regenerator is proposed, by integrating a slow-light photonic crystal waveguide with a band-pass filter based on coupled ring resonators. A route of designing the regenerator is proposed by first using the dispersion engineering results for nonlinear pulse propagation and then using the filter responses to calculate the nonlinear transfer function.

The field of nanophotonics is a major research topic, as it offers potential solutions to important challenges, such as the creation of low power, high bandwidth interconnects or optical sensors. Within this field, resonant structures and slow light waveguides are used to improve device performance further. Photonic crystals are of particular interest, as they allow the fabrication of a wide variety of structures, including high Q-factor cavities and slow light waveguides. The high scattering loss of photonic crystal waveguides, caused by fabrication disorder, however, has so far proven to be the limiting factor for device applications. In this thesis, I present a detailed study of propagation loss in slow light photonic crystal waveguides. I examine the dependence of propagation loss on the group index, and on disorder, in more depth than previous work by other authors. I present a detailed study of the relative importance of different components of the propagation loss, as well as a calculation method for the average device properties. A new calculation method is introduced to study different device designs and to show that photonic crystal waveguide propagation loss can be reduced by device design alone. These “loss engineered” waveguides have been used to demonstrate the lowest loss photonic crystal based delay line (35 dB/ns) with further improvements being predicted (< 20 dB/ns). Novel fabrication techniques were investigated, with the aim of reducing fabrication disorder. Initial results showed the feasibility of a silicon anneal in a nitrogen atmosphere, however poor process control led to repeatability issues. The use of a slow-fast-slow light interface allowed for the fabrication of waveguides spanning multiple writefields of the electron-beam lithography tool, overcoming the problem of stitching errors. The slow-fast-slow light interfaces were combined with loss engineering waveguide designs, to achieve an order of magnitude reduction in the propagation loss compared to a W1 waveguide, with values as low as 130 dB/cm being achieved for a group index around 60.