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An analysis and development of controls for exposures to maintenance personnel working on the plasma metal etchersBoysen, Christopher J. January 1998 (has links) (PDF)
Thesis, PlanB (M.S.)--University of Wisconsin--Stout, 1998. / Includes bibliographical references.
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In situ monitoring of reactive ion etchingMorris, Bryan George Oneal. January 2009 (has links)
Thesis (Ph.D)--Electrical and Computer Engineering, Georgia Institute of Technology, 2010. / Committee Chair: May, Gary; Committee Member: Brand,Oliver; Committee Member: Hasler,Paul; Committee Member: Kohl,Paul; Committee Member: Shamma,Jeff. Part of the SMARTech Electronic Thesis and Dissertation Collection.
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