The ever-increasing need for higher bandwidth and density is one of the motivations for extensive research on planar optoelectronic structures on printed circuit board (PCB) substrates. Among these applications, optical interconnects have received considerable attention in the last decade. Several optical interconnect techniques, such as free space, guided wave, board level and fiber array interconnects, have been introduced for system level applications. In all planar optoelectronic systems, optical waveguides are crucial elements that facilitate signal routing. Low propagation loss, high reliability and manufacturability are among the requirements of polymer optical waveguides and polymer passive devices on PCB substrates for practical applications. Besides fabrication requirements, reliable characterization tools are needed to accurately and nondestructively measure important guiding properties, such as waveguide propagation loss. In three-dimensional (3D) fully embedded board-level optical interconnects, another key challenge is to realize efficient optical coupling between in-plane waveguides and out-of-plane laser/detector devices. Driven by these motivations, the research presented in this thesis focuses on some fundamental studies of optical interconnects for PCB substrates, e.g., developing low-loss optical polymer waveguides with integrated efficient out-of-plane couplers for optical interconnects on printed circuit board substrates, as well as the demonstration of a novel free-space optical interconnect system by using a volume holographic thin film. Firstly, the theoretical and experimental investigations on the limitations of using mercury i-line ultraviolet (UV) proximity photolithography have been carried out, and the metallization techniques for fine copper line formation are explored. Then, a new type of low-loss polymer waveguides (i.e., capped waveguide) is demonstrated by using contact photolithography with considerable performance improvement over the conventional waveguides. To characterize the propagation properties of planar optical waveguides, a reliable, nondestructive, and real-time technique is presented based on accurately imaging the scattered light from the waveguide using a sensitive charge coupled device (CCD) camera that has a built-in integration functionality. To provide surface normal light coupling between waveguides and optoelectronic devices for optical interconnects, a simple method is presented here to integrate 45° total internal reflection micro-mirrors with polymer optical waveguides by an improved tilted beam photolithography (with the aid of de-ionized water) on PCBs. A new technique is developed for a thin layer of metal coating on the micro-mirrors to achieve higher reflection and coupling efficiency (i.e., above 90%). The combination of the capped waveguide technique and the improved tilted UV exposure technique along with a hard reusable metal mask for metal deposition eliminates the usage of the traditional lift-off process, greatly simplifies the process, and reduces fabrication cost without sacrificing the coating quality. For the study of free-space optical interconnects, a simple system is presented by employing a single thin-film polymeric volume holographic element. One 2-spherical-beam hologram is used to link each point light source with the corresponding photodetector. An 8-channel free-space optical interconnect system with high link efficiency is demonstrated by using a single volume holographic element where 8 holograms are recorded.

Optical connectivity has the potential to outperform copper-based TSVs in terms of bandwidth at the cost of more complexity due to the required electro-optical and opto-electrical conversion. The continuously increasing demand for higher bandwidth pushes the breakeven point for a profitable operation to shorter distances. To integrate an optical communication network in a 3D-chip-stack optical through-silicon vertical VIAs (TSV) are required. While the necessary effort for the electrical/optical and vice versa conversion makes it hard to envision an on-chip optical interconnect, a chip-to-chip optical link appears practicable. In general, the interposer offers the potential advantage to realize electro-optical transceivers on affordable expense by specific, but not necessarily CMOS technology. We investigated the realization and characterization of optical interconnects as a polymer based waveguide in high aspect ratio (HAR) TSVs proved on waferlevel. To guide the optical field inside a TSV as optical-waveguide or fiber, its core has to have a higher refractive index than the surrounding material. Comparing different material / technology options it turned out that thermal grown silicon dioxide (SiO2) is a perfect candidate for the cladding (nSiO2 = 1.4525 at 850 nm). In combination with SiO2 as the adjacent polymer layer, the negative resist SU-8 is very well suited as waveguide material (nSU-8 = 1.56) for the core. Here, we present the fabrication of an optical polymer based multimode waveguide in TSVs proved on waferlevel using SU-8 as core and SiO2 as cladding. The process resulted in a defect-free filling of waveguide TSVs with SU-8 core and SiO2 cladding up to aspect ratio (AR) 20:1 and losses less than 3 dB.