La présence de lacunes d’oxygène dans les diélectriques est supposée dégrader les propriétés électriques des transistors « high-k metal gate ». Nous avons donc étudié les possibilités d’une nouvelle méthodologie pour analyser ces défauts dans des couches minces de HfO2. Il s’agit d’utiliser des techniques optimisées pour la caractérisation de nano-dispositifs i.e. la spectroscopie de perte d'énergie des électrons (EELS) en microscopie électronique en transmission et la cathodoluminescence (CL)calibrées par la spectroscopie d’annihilation de positons (PAS). Des films de HfO2 ont été déposés par ALD et PVD sur des substrats de silicium. Pour les besoins du PAS, des couches d’épaisseur (10 à 100nm) supérieure au standard de la nanoélectronique ont été élaborées. D’après leurs analyses par DRX,RBS/NRA, MEB, TEM. Ces couches présentent majoritairement une structure complexe et un excès d’oxygène important. Les résultats PAS dépendent de la technique de dépôt et du traitement thermique.Leur comparaison avec des caractérisations électriques sur les couches les plus minces indique la génération de champs électriques dans la couche, à l’interface avec le substrat et dans le substrat. Ces observations confirment la présence de charges évoquée dans la littérature. Ces études ont permis de mettre au point la méthodologie et les conditions d’acquisition et d’analyse des spectres EELS et CL.Ceux-ci dépendent de la technique de dépôt et du traitement thermique. Cependant la qualité des couches n’a pas permis d’isoler les effets de la stoechiométrie. Ce travail ouvre de nombreuses perspectives pour approfondir la compréhension des phénomènes se déroulant au sein des nano-dispositifs. / The presence of oxygen vacancies in high-k oxides is fore seen to have detrimental effects in high-kmetal gate MOS transistors. To validate this hypothesis, we investigate the possibility of using electron energy loss spectroscopy in an electron transmission microscope (EELS) and the cathodoluminescence(CL) calibrated by the positron annihilation spectroscopy (PAS) to analyze these defects in thin HfO2 layers.To develop this methodology, HfO2 films have been deposited both by ALD and PVD on silicon substrates. To make the samples adapted to the PAS depth resolution, the layers thicknesses (10 to100 nm) are higher than those used in microelectronics. According to XRD, RBS/NRA, MEB, TEM results, these layers present a complex structure and a large excess of oxygen.PAS results depend both on the deposition technique and on the heat treatment. They evidence the presence of electric fields in the oxide layer or at the interface with the substrate. Electrical measurements in the thinnest layers, confirm the presence of charges in the oxide layer as already mentioned in the literature. The sign of these charges changes with heat treatment and is in agreement with the PAS results.EELS improved data acquisition has been developed. The EELS and CL spectra have been analyzed using a systematic methodology allowing to extracting characteristic parameters. They depend on the deposition technique and the heat treatment. However, due to the poor quality of the layers, it has not been possible to isolate the effects of the stoichiometry. This work opens many perspectives to improve knowledge on phenomena occurring in devices.

Neste trabalho estudamos a estrutura eletrônica de defeitos pontuais em diamante , os quais introduzem níveis profundos na faixa proibida deste material. Utilizamos o modelo de aglomerado molecular dentro de dois formalismos: o Método do Espalhamento Múltiplo X (MS- X), que é um método de primeiros princípios e o método \"Complete Neglect of Differential Overlap\" (CNDO/ BW), que é semi-empírico. Foi empregado um tratamento adequado para os orbitais de superfície em cada um dos dois formalismos . Foram estudados dois sistemas: o Nitrogênio substitucional e a vacância simples. Para o Nitrogênio, analisamos as possíveis distorções associadas a este centro, procurando interpretar os resultados experimentais. A vacância simples mostrou-se ser um sistema bastante semelhante à vacância simples em Silício: em ambos os casos observa - se uma distorção Jahn-Teller. O modelo adotado mostrou- se capaz de descrever satisfatoriamente as estruturas eletrônicas dos dois centros estudados, fornecendo resultados quantitativos que são comparados com a experiência . / In this work we studied the electronic structure of point defects in diamond. To do this we used the molecular cluster model within two formalisms: the first-principles X Scattered wave method MS-X ) and the semiempirical Complete Neglect of Differential Overlap (CNOO/BW) method. In each case, an adequate surface orbitals treatment was utilized. We studied the following systems: the substitutional Nitrogen and the simple neutral vacancy. For the substitutional Nitrogen. We analyzed the possible distortion related to this center trying to interprete the experimental results. For the simple neutral vacancy in diamond. The results showed to be similar to the simple Silicon vacancy picture: In both cases we observed a Jahn-Teller distortion (lowering the symmetry of the center). The adopted model showed to be able to describe satisfactorily their electronic structures, and quantitative results are given, which are compared with the experimental data.

Neste trabalho estudamos a estrutura eletrônica de defeitos pontuais em diamante , os quais introduzem níveis profundos na faixa proibida deste material. Utilizamos o modelo de aglomerado molecular dentro de dois formalismos: o Método do Espalhamento Múltiplo X (MS- X), que é um método de primeiros princípios e o método \"Complete Neglect of Differential Overlap\" (CNDO/ BW), que é semi-empírico. Foi empregado um tratamento adequado para os orbitais de superfície em cada um dos dois formalismos . Foram estudados dois sistemas: o Nitrogênio substitucional e a vacância simples. Para o Nitrogênio, analisamos as possíveis distorções associadas a este centro, procurando interpretar os resultados experimentais. A vacância simples mostrou-se ser um sistema bastante semelhante à vacância simples em Silício: em ambos os casos observa - se uma distorção Jahn-Teller. O modelo adotado mostrou- se capaz de descrever satisfatoriamente as estruturas eletrônicas dos dois centros estudados, fornecendo resultados quantitativos que são comparados com a experiência . / In this work we studied the electronic structure of point defects in diamond. To do this we used the molecular cluster model within two formalisms: the first-principles X Scattered wave method MS-X ) and the semiempirical Complete Neglect of Differential Overlap (CNOO/BW) method. In each case, an adequate surface orbitals treatment was utilized. We studied the following systems: the substitutional Nitrogen and the simple neutral vacancy. For the substitutional Nitrogen. We analyzed the possible distortion related to this center trying to interprete the experimental results. For the simple neutral vacancy in diamond. The results showed to be similar to the simple Silicon vacancy picture: In both cases we observed a Jahn-Teller distortion (lowering the symmetry of the center). The adopted model showed to be able to describe satisfactorily their electronic structures, and quantitative results are given, which are compared with the experimental data.