• Refine Query
  • Source
  • Publication year
  • to
  • Language
  • 23
  • 3
  • 2
  • 1
  • 1
  • Tagged with
  • 32
  • 32
  • 32
  • 8
  • 5
  • 5
  • 5
  • 4
  • 4
  • 3
  • 3
  • 3
  • 3
  • 3
  • 3
  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Factors affecting the precision and accuracy of surface temperature measurement using light-pipe radiation thermometers (LPRTs)

Puttitwong, Ekachai, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
2

A new approach to measure the temperature in rapid thermal processing (RTP) /

Yan, Jiang, January 1999 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 114-123). Available also in a digital version from Dissertation Abstracts.
3

Entwicklung neuer physikalischer Optimierungs- und Regelungsverfahren für thermische Reaktoren in der Halbleiterprozessierung

Schafbauer, Thomas. January 2001 (has links) (PDF)
München, Techn. Universiẗat, Diss., 2001.
4

Temperature control and modeling of rapid thermal processing

Cho, Wonhui 28 August 2008 (has links)
Not available / text
5

Distributed parameter control in rapid thermal processing (RTP) /

Vayena, Olga. January 2004 (has links)
Thesis (Ph.D.)--Tufts University, 2004. / Adviser: Haris Doumanidis. Submitted to the Dept. of Mechanical Engineering. Includes bibliographical references (leaves 123-129). Access restricted to members of the Tufts University community. Also available via the World Wide Web;
6

Temperature control and modeling of rapid thermal processing

Cho, Wonhui, Edgar, Thomas F., January 2005 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Supervisor: Thomas F. Edgar. Vita. Includes bibliographical references.
7

Nitridierung von Vanadium und Niob mit einer Thermowaage bzw. dem rapid thermal processing

Berendes, Antje. January 2004 (has links) (PDF)
Frankfurt (Main), Univ., Diss., 2004.
8

Rapid thermal processing of crystalline silicon materials and solar cells

Peters, Stefan. Unknown Date (has links) (PDF)
University, Diss., 2004--Konstanz.
9

Design of rapid thermal processing system for Cu(In,Ga)Se₂-based solar cells. / 銅銦鎵硒太陽能電池中白光退火系統的設計 / Design of rapid thermal processing system for Cu(In,Ga)Se₂-based solar cells. / Tong yin jia xi tai yang neng dian chi zhong bai guang tui huo xi tong de she ji

January 2009 (has links)
Yang, Shihang = 銅銦鎵硒太陽能電池中白光退火系統的設計 / 楊世航. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2009. / Includes bibliographical references (p. 87-91). / Abstract also in Chinese. / Yang, Shihang = Tong yin jia xi tai yang neng dian chi zhong bai guang tui huo xi tong de she ji / Yang Shihang. / Chapter 1 --- Introduction to Photovoltaics --- p.1 / Chapter 1.1 --- "Developments, markets and forecasts" --- p.1 / Chapter 1.2 --- The physics of solar cells --- p.2 / Chapter 1.2.1 --- Light Absorption --- p.2 / Chapter 1.2.2 --- Charge Carrier Separation --- p.6 / Chapter 1.2.3 --- Solar Cell I-V Characteristics --- p.7 / Chapter 1.3 --- Classifications of Solar Cells --- p.10 / Chapter 1.3.1 --- Crystalline silicon solar cell --- p.10 / Chapter 1.3.2 --- Thin film solar cells --- p.12 / Chapter 1.3.3 --- Organic and polymer solar cells --- p.12 / Chapter 1.4 --- "Cu(In,Ga)Se2 Solar Cells" --- p.13 / Chapter 1.4.1 --- State of the art --- p.13 / Chapter 1.4.2 --- Material properties --- p.14 / Chapter 1.4.3 --- Basic processing steps --- p.15 / Chapter 2 --- Equipment design --- p.24 / Chapter 2.1 --- System design concepts --- p.24 / Chapter 2.2 --- Sample transfer chamber --- p.26 / Chapter 2.3 --- Co-evaporation chamber --- p.28 / Chapter 2.3.1 --- Load-lock chamber --- p.28 / Chapter 2.3.2 --- Co-evaporation chamber --- p.31 / Chapter 2.4 --- Sputtering chambers --- p.34 / Chapter 2.4.1 --- Mo sputtering chamber --- p.34 / Chapter 2.4.2 --- Three targets sputtering chamber --- p.36 / Chapter 2.5 --- Other chambers --- p.38 / Chapter 3 --- Design of Rapid Thermal Processing System --- p.42 / Chapter 3.1 --- Introduction to RTP --- p.42 / Chapter 3.1.1 --- History and current status of RTP --- p.42 / Chapter 3.1.2 --- Advantages of RTP system compared to conventional furnaces --- p.45 / Chapter 3.2 --- Computational simulation for RTP system design --- p.47 / Chapter 3.2.1 --- Introduction to Ansys Fluent --- p.47 / Chapter 3.2.2 --- Model setup steps --- p.54 / Chapter 3.2.3 --- Physical principles --- p.57 / Chapter 3.2.4 --- Models setup and comparisons --- p.62 / Chapter 3.3 --- Rapid thermal processing system --- p.76 / Chapter 3.3.1 --- Se deposition chamber --- p.76 / Chapter 3.3.2 --- Quartz chamber --- p.78 / Chapter 3.3.3 --- Lamp frame --- p.79 / Chapter 4 --- Conclusions --- p.83 / Chapter 4.1 --- RTP heater design --- p.83 / Chapter 4.2 --- Future prospect --- p.83 / Bibliography --- p.87
10

Non-invasive thermal profiling of silicon wafer surface during RTP using acoustic and signal processing techniques /

Syed, Ahmed Rashid, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 104-108). Available also in a digital version from Dissertation Abstracts.

Page generated in 0.0793 seconds