Recent advances in growth techniques have lead to the production of high quality GaN and this has played a vital role in the improvement of GaN based devices. A number of device types can be produced from GaN. Spectrally selective devices can be produced by creating ternary or quaternary material systems by partially substituting either Al or In for Ga in GaN. This allows a wide spectral range that can be achieved ranging from the visible to the ultraviolet. The applications of detectors based on these material systems are vast and include areas such as biological, military, environmental, industrial and scientific spheres. In front illuminated Schottky barrier photodetectors, two major factors influencing the sensitivity of the device are the reverse leakage current and the transparency of the Schottky contact. In order to reduce the reverse current of semiconductor based devices, increase the barrier height, and enhance the adhesion of a metal on a semiconductor it is important to subject the contact to annealing. Annealing studies have been performed on AlGaN based photodiodes to investigate the evolution of the optical and electrical properties. In this study, the electrical and optical characteristics of AlGaN based Ni/Au and Ni/Ir/Au Schottky photodiodes were investigated. The electrical properties of the photodiodes were optimised by annealing in an Ar ambient. An increase in the Schottky barrier height and a decrease in the reverse leakage current were observed with increasing annealing temperature up to 500 oC. This effect was observed for both the Ni/Au and Ni/Ir/Au photodiodes. The optical characteristics of the photodiodes, which include the responsivity and the quantum efficiency, were also investigated. UV/visible rejection ratios of as high as 103 were obtained. The transmittance of Ni/Au and Ni/Ir/Au metal layers deposited on a quartz substrate were optimised by annealing. This was under the same ambient conditions as the Schottky photodiode. The transmittance increased with annealing temperature for the Ni/Au metal layer whereas it decreased at higher temperatures for the Ni/Ir/Au layer. The transmittance of the Ni/Au metal layer reached as high as 85 % after 500 oC annealing. The transmittance of the Ni/Ir/Au only reached a high of 41 % after 400 oC annealing. / Dissertation (MSc)--University of Pretoria, 2013. / Physics / unrestricted

Wide bandgap semiconductor photodiodes were investigated for their suitability as radiation detectors for high temperature applications (≥ 20 °C), through measurements, calculations of key parameters of the devices, and relating the results back to the material, geometry of the detectors, environment under which the detectors were investigated, and previously published work. Three families of photodiodes were examined. 4H-SiC vertical Schottky UV photodiodes with Ni2Si interdigitated contacts were characterised for their response under dark and UV illumination. Electrical characterisation up to 120 °C and room temperature responsivity measurements (210 nm to 380 nm) suggested that the devices could operate at low UV light intensities, even at high visible and IR backgrounds without the use of filters, and at high temperatures. 4H-SiC Schottky photodiode detector arrays with planar thin NiSi contacts were investigated for X-ray (≤ 35 keV) detection and photon counting spectroscopy at 33 °C. The electrical characterisation of the devices up to 140 °C and subsequent analysis suggested that the devices are likely to operate as high temperature X-ray spectrometers. Results characterising GaAs p+-i-n+ mesa photodiode detectors for their room temperature visible and near infrared responsivity (580 nm to 870 nm), as well as their high temperature (≤ 60 °C) X-ray detection performance (at 5.9 keV) are presented. GaAs p+-i-n+ mesa photodiodes were also shown to be suitable for β- particle (electron) spectroscopy and X-ray fluorescence spectroscopy (≤ 21 keV) at 33 °C. The X-ray and electron spectroscopic measurements were supported by a comprehensive treatment of the noise components in charge sensitive preamplifiers. Calculations showed the potential benefits of using a SiC, rather than Si, JFET as the input transistor of such a preamplifier operating at high temperatures. The spectroscopic measurements, using both the 4H-SiC and GaAs photodiodes, are presented along with noise analysis to detangle the different noise components present in the reported spectrometers, identify the dominant source of noise, and suggest potential improvements for future spectrometers using the reported devices.

Orientador: José Alexandre Diniz / Dissertação (mestrado) - Universidade Estadual de Campinas, Faculdade de Engenharia Elétrica e de Computação / Made available in DSpace on 2018-08-18T16:42:08Z (GMT). No. of bitstreams: 1 Lima_LucasPetersenBarbosa_M.pdf: 10518299 bytes, checksum: abe557fa5f682bd296c9fb416948d523 (MD5) Previous issue date: 2011 / Resumo: Filmes de nitreto de titânio (TiN) e nitreto de tântalo (TaN) foram depositados sobre substratos de Si (100) utilizando um sistema de sputtering reativo, com diferentes fluxos de N2 (10-80 sccm) e potência (500-1500W), em ambiente de N2/Ar. Foram analisadas as influências da mistura gasosa N2/Ar e potência nas propriedades estruturais e elétricas dos filmes de TiN e TaN, utilizando as técnicas de perfilometria, microscopia de força atômica, 4 pontas, espectroscopia Raman, difração de raios-x e espectroscopia de fotoelétron. As análises físicas e elétricas dos filmes de TiN e TaN demonstram que os filmes são policristalinos, com as orientações preferenciais (311)-( 111) e (200)-( 111), respectivamente. Os valores das taxas de deposições, resistividades elétricas e tamanho de grão para os filmes de TiN e TaN estão entre 4 e 78 nm/min, 150 e 7500 ??.cm e 0,001 e 0,027 ?m2, respectivamente. Foram fabricados capacitores MOS e diodos Schottky com eletrodos superiores de TiN e TaN com dielétricos de SiOxNy ou SiO2, e extraídas curvas CV e IV destes dispositivos, para extração de parâmetros como tensão de flatband (VFB), densidade de carga efetiva (Q0/q) e função trabalho do eletrodo superior (WF). As curvas CV dos capacitores MOS com dielétrico de SiOxNy e eletrodo superior de TiN apresentaram valores extraídos de Q0/q, VFB e WF de 1010 cm2, 0,29 V e 4,65 eV, respectivamente, que são compatíveis com a tecnologia CMOS. As curvas CV dos capacitores MOS com dielétrico de SiOxNy e eletrodo superior de TaN apresentaram valores extraídos de Q0/q, VFB e WF de 1010 cm2, 1,36 V e 3,81 eV, respectivamente, que não são compatíveis com a tecnologia CMOS. As curvas CV dos capacitores MOS com dielétrico de SiO2 e eletrodo superior de TiN apresentaram valores extraídos de Q0/q, VFB e WF de 1010 e 1012 cm2, de 0,12 V e 0,36 V, e, 4,15 eV e 4,43 eV, respectivamente, que são compatíveis com a tecnologia CMOS. As curvas CV dos capacitores MOS com dielétrico de SiO2 e eletrodo superior de TaN apresentaram valores extraídos de Q0/q, VFB e WF de 1010 e 1012 cm2, 0,29 V e 0,20 V, e, 4,41 eV e 4,44 eV, respectivamente, que são compatíveis com a tecnologia CMOS. Estes resultados indicam que os filmes de TiN e TaN são compatíveis para serem utilizados em dispositivos da tecnologia MOS / Abstract: Tantalum nitride (TaN) and titanium nitride (TiN) films have been obtained by DC sputtering, using different nitrogen flow (10 - 80 sccm) and power (500 - 1500 W), in a nitrogen (N2)/argon (Ar) ambient on Si (100) substrates. The N2/Ar ratio in gas mixture and power effects on structural and electrical properties of TaN and TiN films were investigated by scan profiler (film thickness and deposition rate), atomic force microscopy (rms roughness and grain size), fourprobe technique (electrical resistivity), Raman spectroscopy, x-ray diffraction (crystal orientation) and X-ray photoelectron spectroscopy (film composition). The physical and structural analyses of TiN and TaN films show that TiN and TaN films were polycrystalline, with (311)-( 111) and (200)-( 111) preferred orientation, respectively. The deposition rates, electrical resistivities and grain size values of TiN and TaN films were between 4 and 78 nm/min, 150 and 7500 ??.cm and 0,001-0,027 ?m2, respectively. MOS capacitors and Schottky diodes were fabricated with TiN and TaN as upper electrodes and dielectrics with SiOxNy or SiO2. CV and IV measurements were carried out on these devices and flatband voltage (VFB), effective charge density (Q0/q) and metal gate work function (WF) were extracted from these measurements. The extracted values of Q0/q, VFB e WF 1010 cm2, 0,29 V e 4,65 eV, and these values were extracted from CV curves of MOS capacitors with TiN as gate electrode and SiOxNy as gate dielectric. The extracted values of Q0/q, VFB e WF 1010 cm2, 1,36 V e 3,81 eV, and these values were extracted from CV curves of MOS capacitors with TiN as gate electrode and SiOxNy as gate dielectric. The extracted values of Q0/q, VFB and WF were about 1010 and 1012 cm2, 0,12 V and 0,36V, and 4,15 eV and 4,43 eV, and these values were extracted from CV curves of MOS capacitors with TiN as gate electrode and SiO2 as gate dielectric. The extracted values of Q0/q, VFB and WF were about 1010 and 1012 cm2, 0,29 V and 0,20V, and 4,41 eV and 4,44 eV, and these values were extracted from CV curves of MOS capacitors with TaN as gate electrode and SiO2 as gate dielectric. These extracted values for VFB and WF indicates that the TiN and TaN films are suitable for MOS technology / Mestrado / Eletrônica, Microeletrônica e Optoeletrônica / Mestre em Engenharia Elétrica

No description available.

No description available.

The physical and chemical properties of In- and Au- interfaces with In[0.53]Ga[0.47]As/InP(100) and In[0.52]Al[0.48]As(100) formed at room and low temperatures have been studied. Current-voltage measurements have indicated that In contacts to Ino[0.53]Ga[0.47]As(100) formed at 80K exhibit significantly higher Schottky barriers (&phis;b=0.45 eV) than In diodes formed at 294K (&phis;b=0.30 eV), whereas Au diodes formed on In[0.53]Ga[0.47]As(100) at either low temperature or room temperature exhibit Ohmic behaviour. The reactions occurring during interface formation at room and low temperatures have been investigated using soft X-ray photoemission spectroscopy (SXPS) and Transmission Electron Microscopy (TEM).The results presented show that In metallisation of In[0.53]Ga[0.47]As(100) at room temperature results in a predominantly three dimensional mode of growth, accompanied by the out-diffusion of As. Low temperature (125K) metallisation appears to reduce clustering and inhibit As out-diffusion. Examination of the resulting interfaces by TEM confirm the more uniform nature of the metal layers formed at low temperature. Metallisation temperature seems to have little effect on the formation of Au-In[0.53]Ga[0.47]As(100) interfaces, other than to reduce the extent of overlayer clustering, with As out-diffusion apparent for both low and room temperature Au deposition. Interfaces formed between In and In[0.52]Al[0.48]As(100) at both low and room temperature were relatively abrupt with no out-diffusion of substrate species into the metal overlayer. Low temperature metallisation again appeared to reduce overlayer clustering, with TEM studies showing a smaller grain size at low temperature. Au deposition onto In[0.52]Al[0.48]As(100) produced similar interfaces formed at room and low temperature. As diffuses into the Au overlayer to form an Au/As compound at both temperatures, resulting in an interface that is complex and reacted. The degree of overlayer clustering is also thought to be much less pronounced for Au deposition compared to In deposition. Barrier heights measured by SXPS during the study, show good agreement with reported current-voltage measurements for Au and In diodes formed on both In[0.53]Ga[0.47]As/InP(100) and In[0.52]Al[0.48]As(100). Possible mechanisms for the observed adaptation of the pinning position are discussed in the context of current models of Schottky barrier formation.

La conception, fabrication et caractérisation d’un récepteur hétérodyne à 1.2 THz a été effectuée par le Laboratoire d’Etudes du Rayonnement et de la Matière en Astrophysique et Atmosphères (LERMA) et constitue la base de ce rapport de thèse. Les études, analyse et résultats présentés dans ce manuscrit ont été effectués dans le cadre la mission JUpiter ICe moon Explorer (JUICE). JUICE est la première des grandes missions proposées à l’agenda du programme spatial Cosmic Vision 2015-2025 de l’Agence Spatial Européenne (ESA). La mission satellitaire JUICE est consacrée à l’étude du système Jovien. La charge utile du satellite est composée de 10 instruments à l’état-de-l’art et d'une expérience. Le développement du récepteur hétérodyne à 1.2 THz présenté dans cette thèse est dédié à SWI, acronyme anglais de “Submillimeter Wave Instrument", qui, grâce à une résolution spectrale de 107, étudiera à partir de 2030 la structure, la composition et la dynamique des températures de la stratosphère et de la troposphère de Jupiter ainsi que les exosphères et les surfaces des lunes glacées. La partie haute fréquence du récepteur est complètement basée sur la technologie de diodes Schottky planaires sur membrane d'arséniure de galium (GaAs), appelées “Planar Schottky Barrier Diodes” (PSBDs) dans le manuscrit. La réalisation du canal à 1.2 THz de SWI basé sur la technologie Schottky et entièrement développé par le consortium européen, dont fait parti le LERMA, a été le défi le plus significatif rencontré par ce dernier. L'extrême réduction de la taille des anodes des diodes Schottky nécessaire pour monter aux fréquences du THz a été atteinte en collaboration avec le Laboratoire de Photonique et de Nanostructures (LPN) en utilisant la lithographie électronique pour la fabrication de véritables “Monolithic Microwave Integrated Circuits” (MMIC).Une partie importante du ce rapport de thèse et consacrée à l’étude des phénomènes physiques additionnels qui apparaissent quand les dimensions des diodes sont fortement réduites. En particulier, les modifications du comportement résistif et capacitif des diodes Schottky dues à des phénomènes microscopiques bidimensionnels ont été étudiées au moyen d’un simulateur bidimensionnel Monte Carlo (2D-MC), en collaboration avec l’Université de Salamanca, en Espagne.Comme détaillé dans ce manuscrit, la caractérisation précise du comportement capacitif de la diode Schottky est un point critique pour déterminer la plage de fréquences de leur utilisation pour une application donnée. Toute modélisation imprécise de cette propriété de la diode peut entrainer un décalage significatif de la plage de fréquences d’opération d'un circuit THz.Cependant, la modélisation précise des diodes Schottky à ultra-hautes fréquences, n'est qu'une des étapes requises pour réussir à concevoir correctement un circuit THz. L’analyse précise et méticuleuse de l’interaction entre le comportement électromagnétique du chip MMIC et le comportement physique des diodes Schottky a été le but le plus important poursuit dans ce travail doctoral pour le développement du récepteur à 1.2 THz. Cette tâche a été abordée en utilisant les outils commerciaux “High Frequency Simulation/Structure Software” (Ansys-HFSS) et “Keysight Advance Design System” (Keysight-ADS). La combinaison des simulations électromagnétiques des structures tridimensionnelles du chip MMIC (Ansys-HFSS) et les simulations du comportement électrique non-linéaire de la diode Schottky (Keysight-ADS) est la manière actuelle d'aborder la conception de ce type de circuits THz. Le modèle électrique analytique de la diode requis par l’outil ADS a été défini par l'auteur conformément aux résultats précédemment obtenus avec le simulateur physique Monte Carlo. L’implémentation du modèle étendu de la diode Schottky dans cette méthode pour la conception et l'optimisation de chaque étage du récepteur à 1.2THz, est le sujet développé dans ce rapport de thèse. / The design, fabrication and testing of a frequency heterodyne receiver at 1.2 THz has been developed by Laboratoire d’Etudes du Rayonnement et de la Matière en Astrophysique et Atmosphères (LERMA) and it is the foundation of this dissertation. The studies, analysis and results presented in this manuscript have been carried out within the framework of the JUpiter ICe moon Explorer (JUICE) mission. JUICE is one of the proposed missions in the agenda of the European Space Agency (ESA) Cosmic Vision 2015-2025 program. The objective of the JUICE satellite mission is to study the Jovian system, especially the Jupiter atmosphere properties and the surface characteristics of its icy moons. Scientific equipment consisting of ten state-of-the-art instruments and one experiment comprise the payload of this satellite. The development of a 1.2 THz channel is part of the Submillimeter Wave Instrument (SWI) devoted to recovering the spectroscopy data of the Jupiter atmosphere and icy-moons’ surface composition. The scientific principle for this receiver is all-solid-state semiconductor technology based in GaAs Planar Schottky Barrier Diodes (PSBDs). The achievement of a 1.2 THz channel based in PSBDs totally developed by European partners was the major challenge proposed for SWI, with LERMA committed to this assignment. The required ultra-scaling of the Schottky anode size of PSBDs in the attainment of the THz range has been achieved in collaboration with Laboratoire de Photonique et de Nanostructures (LPN) using e-beam photolithography in the fabrication of Monolithic Microwave Integrated Circuits (MMIC). An important part of this dissertation addresses the appearance of additional physical phenomena when ultrascaling solid-state PSBDs. Particularly, the modification of the electrical resistivity and capacitance of SBDs due to two-dimensional phenomena has been studied by means of a physical microscopic Two-Dimensional Monte Carlo (2D-MC) simulator, in collaboration with the University of Salamanca, Salamanca, Spain. As discussed within this manuscript, the accurate characterization of the diode capacitance is one of the critical points when opening a frequency window in the required frequency range of a THz application. A misunderstanding of this modified capacitance during the design of these devices can lead to a considerable offset in the frequency range of the experimental module. However, the accurate modeling of PSBDs in such high frequency applications is only a part of the expertise required for the successful completion of this challenge. The accurate and meticulous analysis of the interrelationship between the electromagnetic behavior of the MMIC chip and the physical behavior of the integrated PSBDs is the main challenge faced in this dissertation for the development of the 1.2 THz receiver. This task has been addressed using the commercial Ansys High Frequency Simulation/Structure Software (Ansys-HFSS) and the Keysight Advance Design System (Keysight-ADS). The combination of the three-dimensional electromagnetic characterization of the chip structure (obtained with HFSS) with the non-linear electrical circuit simulation (carried out by ADS) of diodes is the current methodology for the design of these modules. The analytical electrical model of PSBDs required by ADS software has been defined by this author in agreement with the results obtained with the 2D-MC simulator. The implementation of this approach in the design and optimization of the different stages of the accomplished 1.2 THz receiver is the main subject of this dissertation. The interaction between the physical model of the PSBDs and the electromagnetic modeling of the structure will be discussed within the different chapters of this dissertation. Finally, the mechanical engineering of these applications must be addressed in this discussion.

No description available.

Amorphous Silicon(a-Si) films have attracted the attention of several investigators as it is an economical material for devices. One of the problems that is addressed is the doping of these films after they are prepared. In this thesis, we investigated the effects of doping amorphous Sil­icon films(prepared by r.f. sputtering) with Aluminium(Al) by ther­mal diffusion. Amorphous Silicon films have been prepared on glass substrates at optimal process parameters. Then, the a-Si films are coated with Al by vacuum evaporation and subjected to heating in N2 atmosphere in the temperature range 300°C to 600°C for different durations. After etching Al layer, it has been found that some of the films which are heated around 550°C contain filament like polycrystalline regions surrounding islands of a-Si. This structure has been confirmed through Scanning Electron Mi-croscope(SEM) photographs and electrical conductivity measurements. SEM photographs indicate that, bright regions of amorphous mate­rial are surrounded by dark regions of relatively higher conducting boundaries. The electrical conductivity study shows that there is sharp increase in conductivity of Al doped films, which is attributed to the conduct­ing polycrystalUne filament. A simple model has been proposed to explain the variation of con­ductivity of these transformed films, with process parameters and with temperature. Schottky barrier diodes have been fabricated using these trans­formed materials and their characteristics explained.