Mercury cadmium telluride is important in the detection of electromagnetic radiation in the eight to twelve micron atmospheric window for infrared imaging systems. High resolution infrared imaging systems use either large (256x256 element to 1024x1024 element) staring arrays or much smaller (1-6 element) scanned arrays in which the image is optically scanned across the detectors. In scanned arrays, high resolution and sensitivity may result in the scan direction not being parallel to the detector bias current. The response of an infrared detector to uniform illumination is investigated. It is found that variations in the detector thickness result in significant changes in output voltage. Scanned detectors are modeled in five different orientations; scan parallel to bias, scan opposite to bias, scan perpendicular to bias, and two orientations of the scan diagonal to the bias. The response is analyzed for two cases: 1) the size of the scanned radiation equal to the size of the detector and 2) when the pixel width is half of the width of the detector, but of equal length. Results of the simulation show that the fastest response occurs when the scan and bias are parallel. The largest response occurs when the scan direction is diagonal to the bias, but the response time is much slower than when the bias is parallel to the scan. Therefore, a tradeoff must be made between maximum signal and speed of response. Test detectors are being fabricated and will be tested at FLIR Systems Inc., Portland, Oregon, to confirm the model predictions. / Graduation date: 1992

Modern communications technology has encouraged an intimate connection between Semiconductor Physics and Optics, and this connection shows best in the combination of electron-confining structures with light-confining structures. Semiconductor quantum dots are systems engineered to trap electrons in a mesoscopic scale (the are composed of [approximately] 10000 atoms), resulting in a behavior resembling that of atoms, but much richer. Optical microrseonators are engineered to confine light, increasing its intensity and enabling a much stronger interaction with matter. Their combination opens a myriad of new directions, both in fundamental Physics and in possible applications. This dissertation explores both semiconductor quantum dots and microresonators, through experimental work done with semiconductor quantum dots and microsphere resonators spanning the fields of Quantum Optics, Quantum Information and Photonics; from quantum algorithms to polarization converters. Quantum Optics leads the way, allowing us to understand how to manipulate and measure quantum dots with light and to elucidate the interactions between them and microresonators. In the Quantum Information area, we present a detailed study of the feasibility of excitons in quantum dots to perform quantum computations, including an experimental demonstration of the single-qubit Deutsch-Jozsa algorithm performed in a single semiconductor quantum dot. Our studies in Photonics involve applications of microsphere resonators, which we have learned to fabricate and characterize. We present an elaborate description of the experimental techniques needed to study microspheres, including studies and proof of concept experiments on both ultra-sensitive microsphere sensors and whispering gallery mode polarization converters. / text

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Orientador: Américo Sheitiro Tabata / Banca: Alexandre Levine / Banca: Keizo Yukimitu / Resumo: Uma nova família de semicondutores, a liga quaternária InxGa1-xAs1-yNy, cujo elemento Nitrogênio substitui o elemento Arsênio em pequenas porcentagens, tem recebido grande atenção devido à óptica na região de 1,3 μm, tecnologicamente importante para transmissão de dados em fibra óptica. Estudos sobre caracterização e propriedades ópticas desta liga fornecem maiores informações sobre o comportamento da mesma. Foram estudados poços quânticos, as estruturas básicas de dispositivos optoletrônicos de Inx-Gat-xAso.984N0.0016/GaAs com diferentes valores de concentração x: 26%, 30%, 34%, 38% e 43% crescidas em duas temperaturas diferentes: 400ºC e 430ºC. As amostras foram tratadas termicamente a 700ºC num período de 30 minutos. Com essa liga é tensionada, o foco constou-se em achar um modelo de espessura crítica condinzente para dados experimentais de fotoluminescência. Foram analisadas a dinâmica de portadores, a energia de ativação e a qualidade estrutural das amostras com a técnica de fotoluminescência em diversas condições. Os estudos realizados, aliados ao conhecimento dos parâmetros acima mencionados, têm o objetivo de contribuir para que se possa determinar a aplicabilidade e estimar o rendimento em dispositivos optoeletrônicos, com base neste material / Abstract: A new family of semiconductors has been proposed, the quaternary alloyInxGa1-xAs1-yNy, in which the element Nitrogen replaces the element Arsenic in small percentages. It has received great attention due to the fact of optical emission in the region of 1.3um, technologically important for data transmission at optical fiber. Studies on characterization and optical properties of this alloy provides more information about the conduct of it. It was studied quantum wells, the basic structures of InxGa1-xAs0.016/GaAs optoelectronic devices, with different values of concentration x: 26%, 30%, 34% and 43% grown at two different temperatures: 400ºC and 430ºC. The sample has annealed at 700ºC for 30 min. As this alloy is tensioned, the focus of this research is to find a consistent model of critical thickness for photoluminescence experimental data. It will be done an analysis of the dynamic carriers, activation energy and structural quality of the samples with the analysis of photoluminescence with diverse conditions. With these studies and the knowledge of the parameters mentioned above, it was intended contribute to determine the applicability and estimate the yield of optoeletronic devices based on this material / Mestre

Made available in DSpace on 2014-06-11T19:30:18Z (GMT). No. of bitstreams: 0 Previous issue date: 2012-02-15Bitstream added on 2014-06-13T19:39:43Z : No. of bitstreams: 1 bassettojunior_caz_me_bauru.pdf: 2163683 bytes, checksum: 11953efd83580d13322f0475dd5ae1ff (MD5) / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Uma nova família de semicondutores, a liga quaternária InxGa1-xAs1-yNy, cujo elemento Nitrogênio substitui o elemento Arsênio em pequenas porcentagens, tem recebido grande atenção devido à óptica na região de 1,3 μm, tecnologicamente importante para transmissão de dados em fibra óptica. Estudos sobre caracterização e propriedades ópticas desta liga fornecem maiores informações sobre o comportamento da mesma. Foram estudados poços quânticos, as estruturas básicas de dispositivos optoletrônicos de Inx-Gat-xAso.984N0.0016/GaAs com diferentes valores de concentração x: 26%, 30%, 34%, 38% e 43% crescidas em duas temperaturas diferentes: 400ºC e 430ºC. As amostras foram tratadas termicamente a 700ºC num período de 30 minutos. Com essa liga é tensionada, o foco constou-se em achar um modelo de espessura crítica condinzente para dados experimentais de fotoluminescência. Foram analisadas a dinâmica de portadores, a energia de ativação e a qualidade estrutural das amostras com a técnica de fotoluminescência em diversas condições. Os estudos realizados, aliados ao conhecimento dos parâmetros acima mencionados, têm o objetivo de contribuir para que se possa determinar a aplicabilidade e estimar o rendimento em dispositivos optoeletrônicos, com base neste material / A new family of semiconductors has been proposed, the quaternary alloyInxGa1-xAs1-yNy, in which the element Nitrogen replaces the element Arsenic in small percentages. It has received great attention due to the fact of optical emission in the region of 1.3um, technologically important for data transmission at optical fiber. Studies on characterization and optical properties of this alloy provides more information about the conduct of it. It was studied quantum wells, the basic structures of InxGa1-xAs0.016/GaAs optoelectronic devices, with different values of concentration x: 26%, 30%, 34% and 43% grown at two different temperatures: 400ºC and 430ºC. The sample has annealed at 700ºC for 30 min. As this alloy is tensioned, the focus of this research is to find a consistent model of critical thickness for photoluminescence experimental data. It will be done an analysis of the dynamic carriers, activation energy and structural quality of the samples with the analysis of photoluminescence with diverse conditions. With these studies and the knowledge of the parameters mentioned above, it was intended contribute to determine the applicability and estimate the yield of optoeletronic devices based on this material

M.Sc. / Please refer to full text to view abstract

In this dissertation, cross-sectional potential imaging of GaAs-based homoepitaxial, heteroepitaxial and quantum well structures, all grown by atmospheric pressure Metal-organic Vapor Phase Epitaxy (MOVPE) is investigated. Kelvin probe force microscopy (KPFM), using amplitude modulation (AM) and frequency modulation (FM) modes in air and at room temperature, is used for the potential imaging. Studies performed on n-type GaAs homoepitaxial structures have shown two different potential profiles, related to the difference in electron density between the semi-insulating (SI) substrate and the epilayers. It is shown that the contact potential difference (CPD) between the tip and sample is higher on the semi-insulating substrate side than on the n-type epilayer side. This change in CPD across the interface has been explained by means of energy band diagrams indicating the relative Fermi level positions. In addition, it has also been found that the CPD across the interface increases with electron density. This result is in qualitative agreement with theory. In addition, as known from literature, even under ambient conditions FM mode KPFM provides better lateral resolution and more realistic CPD values than AM mode KPFM. Compared to the case of AM mode analysis, where the experimental CPD values were on average of the theoretical values, the CPD values from FM mode analysis are on average of the theoretical ones. Furthermore, by using FM mode, the transition across the interface is sharper and the surface potential flattens/saturates as expected when scanning sufficiently far away from the junction. The non-neutral space charge region of the sample with an electron density of for example, is as measured by FM-KPFM, whereas for AM-KPFM, the width is even more than and the potential profiles do not saturate. For the p-type GaAs homoepitaxial structures, FM mode measurements from a sample with a dopant density of are presented. As in the case of n-type GaAs,a similar potential profile showing two main domains has been obtained. However, unlike the case of type GaAs where the potential measured on the epilayer side is higher than that on the substrate side, the potential on the epilayer side of the junction is lower in this case due to the fact that the Fermi level of p-type GaAs is below that of the substrate.

The present work studies the disorder in ion-implanted and ion-etched GaAs semiconductors. The primary targets in this study consist of two types of systems:45-keV Be⁺-implanted GaAs and low-energy Ar⁺-etched GaAs. Electronic and lattice structural disorder in these systems are investigated by means of optical reflectivity measurements and Raman-scattering techniques. Visible-ultraviolet reflectivity measurements have identified finite-size effects on the interband electronic excitations in microcrystalline GaAs (μ-GaAs), which is known from previous work to exist in Be⁺-implanted disordered GaAs. The optical properties of μ-GaAs differ appreciably from those of the bulk crystal, the difference increasing with L⁻¹, the inverse of the characteristic size of the microcrystals. The linewidths of the prominent interband features E₁, E₁+∆₁, and E₂ increase linearly and rapidly with inverse microcrystal size: Γ_μ = Γ₀ + AL⁻¹, where Γ₀ (Γ_μ) is the linewidth in the bulk crystal (μ-GaAs), and A is a constant. A simple theory is proposed which semi-quantitatively accounts for the observed size effects. Small microcrystal size implies a short time for an excited carrier to reach, and to be scattered by, the microcrystal boundary, thus limiting the excited-state lifetime and broadening the excited-state energy. An alternative uncertainty-principle argument is also given in terms of the confinement-induced k-space broadening of electron states. The near-surface structural disorder in Ar⁺-etched GaAs has been investigated using a combination of Raman scattering and optical reflectivity measurements. The longitudinal optical (LO) Raman mode in the ion-damaged medium preserves its crystalline lineshape, indicating that the crystalline long-range order is retained in the disordered structure. The structural damage is depth-profiled with LO Raman intensity measurements together with wet chemical etching. A graded damage model proposed in the work well explains the observed LO intensity in the ion-damaged, chemical-etched GaAs. The reflectivity measurements qualitatively support the Raman scattering findings. In addition, the reflectivity spectrum exhibits a red-shift of the peaks associated with the interband electronic transitions. Such a peak shift is likely to arise from the electron-defect interaction in the disordered surface medium. / Ph. D.

Dissertation (PhD)--University of Stellenbosch, 2006. / Please refer to full text for abstract.