Technology scaling beyond Moore’s law demands cutting-edge solutions of the gate length scaling in sub-10 nm regime for low power high speed operations. Recently SOI technology has received considerable attention, however manufacturable solutions in sub-10 nm technologies are not yet known for future nanoelectronics. Therefore, to continue scalinginsub-10 nm region, new one(1D) and two dimensional(2D) “nano-materials” and engineering are expected to keep its pace. However, significant challenges must be overcome for nano-material properties in carrier transport to be useful in future silicon nanotechnology. Thus, it is very important to understand and modulate their electronic band structure and transport properties for low power nanoelectronics applications. This thesis tries to provide solutions for some problems in this area. In recent times, one dimensional Silicon nanowire has emerged as a building block for the next generation nano-electronic devices as it can accommodate multiple gate transistor architecture with excellent electrostatic integrity. However as the experimental study of various energy band parameters at the nanoscale regime is extremely challenging, usually one relies on the atomic level simulations, the results of which are at par with the experimental observations. Two such parameters are the band gap and effective mass, which are of pioneer importance for the understanding of the current transport mechanism. Although there exists a large number of empirical relations of the band gap in relaxed Silicon nanowire, however there is a growing demand for the development of a physics based analytical model to standardize different energy band parameters which particularly demands its application in TCAD software for predicting different electrical characteristics of novel devices and its strained counterpart to increase the device characteristics significantly without changing the device architecture. In the first part of this work reports the analytical modeling of energy band gap and electron transport effective mass of relaxed and strained Silicon nanowires in various crystallographic directions for future nanoelectronics. The technology scaling of gate length in beyond Moore’s law devices also demands the SOI body thickness, TSi0 which is essentially very challenging task in nano-device engineering. To overcome this circumstance, two dimensional crystals in atomically thin layered materials have found great attention for future nanolectronics device applications. Graphene, one layer of Graphite, is such 2D materials which have found potentiality in high speed nanoelectronics applications due to its several unique electronic properties. However, the zero band gap in pure Graphene makes it limited in switching device or transistor applications. Thus, opening and tailoring a band gap has become a highly pursued topic in recent graphene research. The second part of this work reports atomistic simulation based real and complex band structure properties Graphene-Boron nitride heterobilayer and Boron Nitride embedded Graphene nanoribbons which can improve the grapheme and its nanoribbon band structure properties without changing their originality. This part also reports the direct band-to-band tunneling phenomena through the complex band structures and their applications in tunnel field effect transistors(TFETs) which has emerged as a strong candidate for next generation low-stand by power(LSTP) applications due to its sub-60mV/dec Sub threshold slope(SS). As the direct band-to-band tunneling(BTBT) is improbable in Silicon(either its bulk or nanowire form), it is difficult to achieve superior TFET characteristics(i.e., very low SS and high ON cur-rent) from the Silicon TFETs. Whereas, it is explored that much high ON current and very low subthreshold slope in hybrid Graphene based TFET characteristics open a new prospect in future TFETs. The investigations on ultrathin body materials also call for a need to explore new 2D materials with finite band gap and their various nanostructures for future nanoelectronic applications in order to replace conventional Silicon. In the third part of this report, we have investigated the electronic and dielectric properties of semiconducting layered Transition metal dichalcogenide materials (MX2)(M=Mo, W;X =S, Se, Te) which has recently emerged as a promising alternative to Si as channel materials for CMOS devices. Five layered MX2 materials(exceptWTe2)in their 2D sheet and 1D nanoribbon forms are considered to study the real and imaginary band structure of thoseMX2 materials by atomistic simulations. Studying the complex dispersion properties, it is shown that all the five MX2 support direct BTBT in their monolayer sheet forms and offer an average ON current and subthresholdslopeof150 A/mand4 mV/dec, respectively. However, onlytheMoTe2 support direct BTBT in its nanoribbon form, whereas the direct BTBT possibility in MoS2 and MoSe2 depends on the number of layers or applied uniaxial strain. WX2 nanoribbons are shown to be non-suitable for efficient TFET operation. Reasonably high tunneling current in these MX2 shows that these can take advantage over conventional Silicon in future tunnel field effect transistor applications.

Les travaux dans cette thèse ont pour objectif la synthèse de catalyseurs (nanoparticules de cuivre) de taille contrôlée pour la synthèse de nanofils de silicium dans des conditions compatibles CMOS, c'est-à-dire en évitant l'utilisation de l'or comme catalyseur et pour des croissances basse température (<450°C). Les résultats obtenus ont permis de montrer que les techniques de chimie de surface classiquement utilisées pour la préparation de catalyseurs sur des supports 3D (silice, nitrure de titane…) sont directement applicables et transférables sur des supports 2D (wafer de silicium recouvert de films fins de SiO2, SiOx et TiN). Nous avons par exemple pu préparer des nanoparticules de cuivre de taille contrôlée (de 3 nm à 40 nm de diamètre moyen suivant les conditions expérimentales et supports). De plus, les mécanismes de formation des nanoparticules en fonction des propriétés de surface des matériaux étudiés ont été démontrés en combinant diverses techniques d'analyses de surface. La croissance de nanofils de silicium à partir de ces catalyseurs sur substrats 2D a également été réalisée avec succès dans des procédés à basse température. Il a notamment été montré l'existence d'un diamètre minimum critique à partir de laquelle la croissance basse température était possible / The work presented in this PhD thesis aimed at the preparation of copper nanoparticles of controllable size and their utilization as catalysts for the growth of silicon nanowires in a process compatible with standard CMOS technology and at low temperature (< 450°C). The growth of silicon nanowires by Chemical Vapor Deposition (CVD) via the catalytic decomposition of a silicon precursor on metallic nanoparticles at low temperature (Vapor Solid-Solid process) was demonstrated to be possible from an oxidized Cu thin film. However, this process does not allow the control over nanowires diameter, which is controlled by the diameter of the nanoparticle of catalyst. In this PhD is presented a fully bottom-up approach to prepare copper nanoparticles of controllable size directly on a surface without the help of external stabilizer by mean of surface organometallic chemistry. First, the preparation of copper nanoparticles is demonstrated on 3D substrates (silica and titanium nitride nanoparticles), along with the fine comprehension of the formation mechanism of the nanoparticles as a function of the surface properties. Then, this methodology is transferred to planar (2D) substrates typically used in microelectronics (silicon wafers). Surface structure is demonstrated to direct the Cu nanoparticles diameter between 3 to 40 nm. The similarities between the 2D and 3D substrates are discussed. Finally, the activity of the Copper nanoparticles in the growth of Silicon nanowire is presented and it is demonstrated that in our conditions a critical diameter may exist above which the growth occurs

We show full Li/S cells with the use of balanced and high capacity electrodes to address high power electro-mobile applications. The anode is made of an assembly comprising of silicon nanowires as active material densely and conformally grown on a 3D carbon mesh as a light-weight current collector, offering extremely high areal capacity for reversible Li storage of up to 9 mAh/cm(2). The dense growth is guaranteed by a versatile Au precursor developed for homogenous Au layer deposition on 3D substrates. In contrast to metallic Li, the presented system exhibits superior characteristics as an anode in Li/S batteries such as safe operation, long cycle life and easy handling. These anodes are combined with high area density S/C composite cathodes into a Li/S full-cell with an ether- and lithium triflate-based electrolyte for high ionic conductivity. The result is a highly cyclable full-cell with an areal capacity of 2.3 mAh/cm(2), a cyclability surpassing 450 cycles and capacity retention of 80% after 150 cycles (capacity loss <0.4% per cycle). A detailed physical and electrochemical investigation of the SiNW Li/S full-cell including in-operando synchrotron X-ray diffraction measurements reveals that the lower degradation is due to a lower self-reduction of polysulfides after continuous charging/discharging.

Dans cette thèse, nous avons fabriqué des cellules solaires à jonction radiale en nanofils de silicium avec du silicium microcristallin hydrogéné (µc-Si:H) comme absorbeur, par dépôt chimique en phase vapeur assisté par plasma à basse température (PECVD). Pour contrôler la densité de nanofils sur les substrats, nous avons utilisé des nanoparticules (NP) de dioxyde d'étain (SnO₂) d'un diamètre moyen de 55 nm, disponibles dans le commerce, comme précurseur du catalyseur Sn pour la croissance des nanofils de silicium. La distribution des nanoparticules de SnO₂ sur le substrat a été contrôlée par centrifugation et dilution du colloïde de SnO₂, en combinaison avec la fonctionnalisation du substrat. Par la suite, le SnO₂ est réduit en Sn métallique après le traitement par plasma de H₂, suivi de la croissance, par la technique vapeur-liquide-solide (VLS) assistée par plasma, de nanofils de Si sur lesquels sont déposées les couches P, I et N constituant les cellules solaires à jonction radiale. Nous avons atteint un taux de croissance élevé des nanofils de Si, jusqu'à 70%, avec une très large gamme de densité, de 10⁶ à 10⁹ /cm². Comme approche supplémentaire de contrôle de la densité des nanofils, nous avons utilisé du Sn évaporé comme précurseur du catalyseur Sn. Nous avons étudié l'effet de l'épaisseur de Sn évaporé, l'effet de la durée du traitement au plasma de H₂ et l'effet du débit de gaz H₂ dans le dans le mélange de précurseurs, sur la densité des nanofils. L'ellipsométrie spectroscopique in-situ (SE) a été utilisée pour contrôler la croissance des nanofils et le dépôt des couches de µc-Si:H sur les SiNWs. En combinant les résultats de in-situ SE et de microscopie électronique à balayage, une relation entre l'intensité du signal de SE pendant la croissance et la longueur et la densité des nanofils a été démontrée, ce qui permet d'estimer ces paramètres en cours de croissance. Nous avons réalisé une étude systématique des matériaux (couches intrinsèques et dopées de type n ou p de µc-Si:H, couches dopées d'oxyde de silicium microcristallin hydrogéné, µcSiOx:H) et des cellules solaires obtenues dans deux réacteurs à plasma appelés "PLASFIL" et "ARCAM". Les épaisseurs de revêtement sur substrat lisse et sur les nanofils ont été déterminées et nous avons obtenu une relation linéaire entre les deux, ce qui permet de concevoir un revêtement conforme sur les nanofils pour chaque couche avec une épaisseur optimale. Les paramètres des nanofils et des matériaux, affectant la performance des cellules solaires à jonction radiale, ont été systématiquement étudiés, les principaux étant la longueur et la densité des nanofils, l'épaisseur de la couche intrinsèque de µc-Si:H, l'utilisation de µc-SiOx:H et le réflecteur arrière en Ag. Enfin, avec les cellules solaires à jonction radiale en nanofils de silicium optimisées utilisant le µc-Si:H comme absorbeur, nous avons atteint un rendement de conversion de l'énergie de 4,13 % avec Voc = 0,41 V, Jsc = 14,4 mA/cm² et FF = 69,7%. Cette performance est supérieure de plus de 40 % à l'efficacité record de 2,9 % publiée précédemment. / In this thesis, we have fabricated silicon nanowire (SiNW) radial junction solar cells with hydrogenated microcrystalline silicon (μc-Si:H) as the absorber via low-temperature plasma-enhanced chemical vapor deposition (PECVD). To control the density of NW on the substrates, we have used commercially available tin dioxide (SnO₂) nanoparticles (NPs) with an average diameter of 55 nm as the precursor of Sn catalyst for the growth of SiNWs. The distribution of SnO₂ NPs on the substrate has been controlled by centrifugation and the dilution of the SnO₂ colloid, combined with the functionalization of the substrate. Subsequently, SnO₂ is reduced to metallic Sn after the H₂ plasma treatment, followed by the plasma-assisted vapor-liquid-solid (VLS) growth of SiNWs upon which the P, I and N layers constituting the radial junction solar cells are deposited. We have achieved a high yield growth of SiNWs up to 70% with a very wide range of NW density, from 10⁶ to 10⁹ /cm². As an additional approach of controlling the density of SiNWs we have used evaporated Sn as the precursor of Sn catalyst. We have studied the effect of the thickness of evaporated Sn, the effect of duration of H₂ plasma treatment and the effect of H₂ gas flow rate in the plasma, on the density of SiNWs.In-situ spectroscopic ellipsometry (SE) was used for monitoring the growth of SiNWs and the deposition of the layers of μc-Si:H on SiNWs. Combining in-situ SE and SEM results, a relationship between the intensity of SE signal and the length and the density of SiNWs during the growth was demonstrated, which allows to estimate the density and the length of SiNWs during the growth. We have carried out a systematic study of materials (intrinsic, p-type,n-type µc-Si:H and µcSiOx:H doped layers) and solar cells obtained in two plasma reactors named “PLASFIL” and “ARCAM”. The thicknesses of coating on the flat substrate and on the SiNWs have been determined with a linear relation which helps to design a conformal coating on SiNWs for each layer with an optimal thickness. The parameters of the SiNWs and the materials, affecting the performance of radial junction solar cells, have been systematically studied, the main ones being the length and the density of SiNWs, the thickness of intrinsic layer of μc-Si:H on SiNWs, the use of the hydrogenated microcrystalline silicon oxide (μc-SiOx:H) and the back reflector Ag. Finally, with the optimized silicon nanowire radial junction solar cells using the μc-Si:H as the absorber we have achieved an energy conversion efficiency of 4.13 % with Voc = 0.41 V, Jsc = 14.4 mA/cm² and FF = 69.7%. This performance is more than 40 % better than the previous published record efficiency of 2.9 %.

Reconfigurable transistors merge unipolar p- and n-type characteristics of field-effect transistors into a single programmable device. Combinational circuits have shown benefits in area and power consumption by fine-grain reconfiguration of complete logic blocks at runtime. To complement this volatile programming technology, a proof of concept for individually addressable reconfigurable nonvolatile transistors is presented. A charge-trapping stack is incorporated, and four distinct and stable states in a single device are demonstrated.

Recently, there has been a growing interest in semiconductor and semiconducting oxide nanowires for applications in electronics, energy conversion, energy storage and optoelectronic devices such as field effect transistors, solar cells, Li- ion batteries, gas sensors, light emitting diodes, field emission displays etc. Semiconductor and semiconducting oxide nanowires have been synthesized widely by different vapor transport methods. However, conditions like high growth temperature, low vacuum, carrier gases for the growth of nanowires, limit the applicability of the processes for the growth of nanowires on a large scale for different applications. In this thesis work, studies have been made on the growth of semiconductor and semiconducting oxide nanowires at a relatively lower substrate temperature (< 500 °C), in a high vacuum (1× 10-5 mbar), without employing any carrier gas, by electron beam and resistive thermal evaporation processes. The morphology, microstructure, and composition of the nanowires have been investigated using analytical techniques such as SEM, EDX, XRD, XPS, and TEM. The optical properties of the films such as reflectance, transmittance in the UV-visible and near IR region were studied using a spectrophotometer. Germanium nanowires were grown at a relatively lower substrate temperature of 380-450 °C on Si substrates by electron beam evaporation (EBE) process using a Au-assisted Vapor-Liquid-Solid mechanism. High purity Ge was evaporated in a high vacuum of 1× 10-5 mbar, and gold catalyst coated substrates maintained at a temperature of 380-450 °C resulted in the growth of germanium nanowires via Au-catalyzed VLS growth. The influence of deposition parameters such as the growth temperature, Ge evaporation rate, growth duration, and gold catalyst layer thickness has been investigated. The structural, morphological and compositional studies have shown that the grown nanowires were single-crystalline in nature and free from impurities. The growth mechanism of Germanium nanowires by EBE has been discussed. Studies were also made on Silicon nanowire growth with Indium and Bismuth as catalysts by electron beam evaporation. For the first time, silicon nanowires were grown with alternative catalysts by the e-beam evaporation method. The use of alternative catalysts such as Indium and Bismuth results in the decrease of nanowire growth temperature compared to Au catalyzed Si nanowire growth. The doping of the silicon nanowires is possible with an alternative catalyst. The second part of the thesis concerns the growth of oxide semiconductors such as SnO2, Sn doped Indium oxide (ITO) nanowires by the electron beam evaporation method. For the first time, SnO2 nanowires were grown with a Au-assisted VLS mechanism by the electron beam evaporation method at a low substrate temperature of 450 °C. SEM, XRD, XPS, TEM, EDS studies on the grown nanowires showed that they were single crystalline in nature and free of impurities. The influence of deposition parameters such as the growth temperature, oxygen partial pressure, evaporation rate of Sn, and the growth duration has been investigated. Studies were also done on the application of SnO2 nanowire films for UV light detection. ITO nanowires were grown via a self-catalytic VLS growth mechanism by electron beam evaporation without the use of any catalyst at a low substrate temperature of 250-400 °C. The influence of deposition parameters such as the growth temperature, oxygen partial pressure, evaporation rate of ITO, and growth duration has been investigated. Preliminary studies have been done on the application of ITO nanowire films for transparent conducting coatings as well as for antireflection coatings. The final part of the work is on the Au-assisted and self catalytic growth of SnO2 and In2O3 nanowires on Si substrates by resistive thermal evaporation. For the first time, SnO2 nanowires were grown with a Au-assisted VLS mechanism by the resistive thermal evaporation method at a low substrate temperature of 450 °C. SEM, XRD, XPS, TEM, and EDS studies on the grown nanowires showed that they were single crystalline in nature and free of impurities. Studies were also made on the application of SnO2 nanowire films for methanol sensing. The self-catalytic growth of SnO2 and In2O3 nanowires were deposited in high vacuum (5×10-5 mbar) by thermal evaporation using a modified evaporation source and a substrate arrangement. With this arrangement, branched SnO2 and In2O3 nanowires were grown on a Si substrate. The influence of deposition parameters such as the applied current to the evaporation boat, and oxygen partial pressure has been investigated. The growth mechanism behind the formation of the branched nanowires as well as nanowires has been explained on the basis of a self-catalytic vapor-liquid-solid growth mechanism. The highlight of this thesis work is employing e-beam evaporation and resistive thermal evaporation methods for nanowire growth at low substrate temperatures of ~ 300-500 °C. The grown nanowires were tested for applications such as gas sensing, transparent conducting coatings, UV light detection and antireflection coating etc. The thesis is divided into nine chapters and each of its content is briefly described below. Chapter 1 In this chapter, a brief introduction is given on nanomaterials and their applications. This chapter also gives an overview of the different techniques and different growth mechanisms used for nanowires growth. A brief overview of the applications of semiconductors and semiconductor oxide nanowires synthesized is also presented. Chapter 2 Different experimental techniques employed for the growth of Si, Ge, SnO2, In2O3, ITO nanowires have been described in detail in this chapter. Further, the details of the different techniques employed for the characterization of the grown nanowires were also presented. Chapter 3 In this chapter, studies on the growth of Germanium nanowires by electron beam evaporation (EBE) are given. The influence of deposition parameters such as growth temperature, evaporation rate of germanium, growth duration, and catalyst layer thickness was investigated. The morphology, structure, and composition of the nanowires were investigated by XRD, SEM, and TEM. The VLS growth mechanism has been discussed for the formation of the germanium nanowires by EBE using Au as a catalyst. Chapter 4 This chapter discusses the growth of Si nanowires with Indium and Bismuth as an alternate to Au-catalyst by electron beam evaporation. The influence of deposition parameters such as growth temperature, Si evaporation rate, growth duration, and catalyst layer thickness has been investigated. The grown nanowires were characterized using XRD, SEM, TEM and HRTEM. The Silicon nanowires growth mechanism has been discussed. Chapter 5 This chapter discusses the Au-catalyzed VLS growth of SnO2 nanowires by the electron beam evaporation method as well as Antimony doped SnO2 nanowires by co-evaporation method at a low substrate temperature of 450 °C. The grown nanowires were characterized using XRD, SEM, TEM, STEM, Elemental mapping, HRTEM, and XPS. The effect of deposition parameters such as oxygen partial pressure, growth temperature, catalyst layer thickness, evaporation rate of Sn, and the growth duration of nanowires were investigated. The SnO2 nanowires growth mechanism has been explained. Preliminary studies were made on the possible use of pure SnO2 and doped SnO2 nanowire films for UV light detection. SnO2 nanowire growth on different substrates such as stainless steel foil (SS), carbon nanosheets films, and graphene oxide films were studied. SnO2 nanowire growth on different substrates, especially SS foil will be useful for Li-ion battery applications. Chapter 6 This chapter discusses the self catalyzed VLS growth of Sn doped Indium oxide (ITO) nanowires by the electron beam evaporation method at a low temperature of 250-400 °C. The grown nanowires were characterized using XRD, SEM, TEM, STEM, HRTEM, and XPS. The effect of deposition parameters such as oxygen partial pressure, growth temperature, evaporation rate of ITO, and the growth duration of the nanowires were investigated. Preliminary studies were also made on the possible use of self-catalyzed ITO nanowire films for transparent conducting oxides and antireflection coatings. ITO nanowire growth on different and large area substrates such as stainless steel foil (SS), and Glass was done successfully. ITO nanowire growth on different substrates, especially large area glass substrates will be useful for optoelectronic devices. Chapter 7 In this chapter, studies on the growth of SnO2 nanowires by a cost-effective resistive thermal evaporation method at a relatively lower substrate temperature of 450 °C are presented. The grown nanowires were characterized using XRD, SEM, TEM, HRTEM, and XPS. Preliminary studies were done on the possible use of SnO2 nanowire films for methanol sensing. Chapter 8 This chapter discusses the self-catalytic growth of SnO2 and In2O3 nanowires by resistive thermal evaporation. The nanowires of SnO2 and In2O3 were grown at low temperatures by resistive thermal evaporation using a modified source and substrate arrangement. In this arrangement, branched SnO2 nanowires, and In2O3 nanowires growth was observed. The grown nanowires were characterized using XRD, SEM, TEM, HRTEM, and XPS. The possible growth mechanism for branched nanowires growth has been explained. Chapter 9 The significant results obtained in the present thesis work have been summarized in this chapter.