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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
1

Characterisation of beta-FeSi2 fabricated by ion beam assisted deposition

McKinty, Colin N. January 2001 (has links)
beta-FeSi2 has been shown to have a minimum direct band gap of 0.87 eV, which leads to the opportunity of Si based opto-electronics. One of the many applications that beta-FeSi2 has been linked with is solar cells. Its proposed suitability for solar cell applications originates from a large absorption coefficient above the fundamental edge (105 cm-1), predicted solar cell efficiencies as high as 23% and photoelectric properties with a quantum efficiency of 32%. Ion beam assisted deposition represent a technique that is suitable for producing low cost material over large areas, thus making it suitable for solar cell fabrication. The work reported here represents an in-depth optical characterisation of the effects of fabrication and post-fabrication processing on ion beam assisted deposited FeSi layers on Si substrates. Two different sets of substrates have been investigated; the first were deposited with layers of Fe and Si in the ratios between (40%:60%) and (29%:71%), and the second were deposited in stoichiometric ratios (1:2). A range of post-fabrication processes have been investigated, these have included studying the effects of annealing time (10 minutes to 18 hours) and temperature (100°C to 900°C) on the band gap and defects underneath the fundamental absorption edge. A study of the effect of annealing regime on the measurement temperature dependency of the band gap was also completed. The results have shown that annealing temperature has a stronger effect on the band gap rather than annealing time, while both affect the absorption underneath the fundamental edge. Optical evidence for the formation of beta-FeSi2 was found for annealing temperatures as low as 425°C. Increasing the annealing temperature/time also results in structural changes in the material, which are dependent on the as-deposited composition of the FeSi layer. beta-FeSi2/Si(n-type) solar cell devices have been fabricating, showing rectifying I-V characteristics, and a photo-voltage spectral response that indicated two distinct regions; 0.72 eV to 1.1 eV and 1.1 eV and above.

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