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Optimization of glow discharge magnetron sputtering for deposition of high Tc superconducting thin filmsRamezani-Namin, Mehrdad January 1996 (has links)
No description available.
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12 |
Some electrical and optical properties of the co-evaporated SiOsub(x)/Ge filmsAbeysuriya, W. D. B. S. January 1986 (has links)
No description available.
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Dielectric properties of thin films based on CeO2̲Al-Dhhan, Z. T. January 1988 (has links)
No description available.
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14 |
The production of porous and chemically reactive coatings by magnetron sputteringO'Brien, Janet January 1998 (has links)
No description available.
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15 |
Silicon sublimation at ultra high vacuum with microprocessor monitoring and measurementsAl-Rawi, S. A. N. January 1988 (has links)
No description available.
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16 |
Determination of physical and magnetic microstructure by STEMMcFadyen, Ian Robson January 1986 (has links)
No description available.
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17 |
Radiofrequency studies at low and intermediate temperaturesMorris, I. D. January 1988 (has links)
No description available.
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18 |
Stucture and properties of sputter deposited Y-Ba-Cu-O thin filmsMingard, Kenneth Philip January 1990 (has links)
No description available.
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19 |
Fabrication and characterization of titanium-doped hydroxyapatite thin filmsDesai, Amit Y. January 2007 (has links)
Hydroxyapatite [Ca10(PO4)6(OH)2, HA] is used in many biomedical applications including bone grafts and joint replacements. Due to its structural and chemical similarities to human bone mineral, HA promotes growth of bone tissue directly on its surface. Substitution of other elements has shown the potential to improve the bioactivity of HA. Magnetron co-sputtering is a physical vapour deposition technique which can be used to create thin coatings with controlled levels of a substituting element. Thin films of titanium-doped hydroxyapatite (HA-Ti) have been deposited onto silicon substrates at three different compositions. With direct current (dc) power to the Ti target of 5, 10, and 15W films with compositions of 0.7, 1.7 and 2.0 at.% titanium were achieved. As-deposited films, 1.2 μm thick, were amorphous but transformed into a crystalline film after heat-treatment at 700C. Raman spectra of the PO4 band suggests the titanium does not substitute for phosphorous. X-ray diffraction revealed the c lattice parameter increases with additional titanium content. XRD traces also showed titanium may be phase separating into TiO2, a result which is supported by analysis of the Oxygen 1s XPS spectrum. In-vitro observations show good adhesion and proliferation of human osteoblast (HOB) cells on the surface of HA-Ti coatings. Electron microscopy shows many processes (i.e. filopodia) extended from cells after day one in-vitro and a confluent, multi-layer of HOB cells after day three. These finding indicate that there may be potential for HA-Ti films as a novel implant coating to improve upon the bioactivity of existing coatings.
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20 |
Fabrication of a cadmium sulfide thin film transistor using chemical bath depositionVoss, Curtis L. 08 March 2002 (has links)
Graduation date: 2002
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